Directed self-assembly of laterally confined lamellae-forming diblock copolymers: polydispersity and substrate interaction effects

Hassei Takahashi; Nabil Laachi; Su-Mi Hur; Corey J. Weinheimer; David Shykind; Glenn H. Fredrickson

doi:10.1117/12.916578

21 March 2012 Directed self-assembly of laterally confined lamellae-forming diblock copolymers: polydispersity and substrate interaction effects

Hassei Takahashi, Nabil Laachi, Su-Mi Hur, Corey J. Weinheimer, David Shykind, Glenn H. Fredrickson

Author Affiliations +

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83231N (2012) https://doi.org/10.1117/12.916578
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Theoretical methods are critical to our understanding of defect formation in block copolymer lithography processes. We have previously applied self-consistent field theory (SCFT) to study the energetics of dislocation and disclination defects prevalent in graphoepitaxy of "standing up" lamellae, and present results of a further refined approach accounting for polydispersity and polymer-substrate interactions. Broadening the scope of our investigation to include systems that deviate from the ideal monodisperse and neutral substrate conditions provides insight into how precisely these factors must be controlled to effectively suppress defects experimentally.

Citation Download Citation

Hassei Takahashi, Nabil Laachi, Su-Mi Hur, Corey J. Weinheimer, David Shykind, and Glenn H. Fredrickson "Directed self-assembly of laterally confined lamellae-forming diblock copolymers: polydispersity and substrate interaction effects", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231N (21 March 2012); https://doi.org/10.1117/12.916578

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