Automated S/TEM metrology on advanced semiconductor gate structures

M. Strauss; J. Arjavac; D. N. Horspool; K. Nakahara; C. Deeb; C. Hobbs

doi:10.1117/12.916526

3 April 2012 Automated S/TEM metrology on advanced semiconductor gate structures

M. Strauss, J. Arjavac, D. N. Horspool, K. Nakahara, C. Deeb, C. Hobbs

Proceedings Volume 8324, Metrology, Inspection, and Process Control for Microlithography XXVI; 83240Z (2012) https://doi.org/10.1117/12.916526
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Alternate techniques for obatining metrology data from advanced semiconductor device structures may be required. Automated STEM-based dimensional metrology (CD-STEM) was developed for complex 3D geometries in read/write head metrology in teh hard disk drive industry. It has been widely adopted, and is the process of record for metrology. Fully automated S/TEM metrology on advanced semiconductor gate structures is viable, with good repeatability and robustness. Consistent automated throughput of 10 samples per hour was achieved. Automated sample preparation was developed with sufficient throughput and quality to support the automated CD-STEM.

Citation Download Citation

M. Strauss, J. Arjavac, D. N. Horspool, K. Nakahara, C. Deeb, and C. Hobbs "Automated S/TEM metrology on advanced semiconductor gate structures", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83240Z (3 April 2012); https://doi.org/10.1117/12.916526

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