Nanostructure photolithography based on surface plasmonic interference

Wei Xiao; Chinhua Wang; Genhua Chen; Fuyang Xu; Yimin Lou; Bing Cao; Guiju Zhang

doi:10.1117/12.977310

15 October 2012 Nanostructure photolithography based on surface plasmonic interference

Wei Xiao, Chinhua Wang, Genhua Chen, Fuyang Xu, Yimin Lou, Bing Cao, Guiju Zhang

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 841814 (2012) https://doi.org/10.1117/12.977310
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

In this paper, we present a novel photolithographic technique to achieve variable 1D or 2D nanostructural patterns using a fixed 2-D metallic phase mask based on surface plasmonic interference. With different polarizing orientations of the incident light and a diffraction-limited phase mask which is formed by a metallic square array with a large period, surface plasmons (SPs) interferometric parttens with resolutions beyond diffraction limit can be obtained. The effects of different polarizing orientations of the linearly polarized incident light on the generation of uniform nanostructures have been investigated by the finite-difference time-domain (FDTD) method. Numerical simulation results show that 1D and/or 2D tunable nanostructures with resolutions beyond diffraction limit can be obtained by controlling the polarizing orientation of the incident light.

Citation Download Citation

Wei Xiao, Chinhua Wang, Genhua Chen, Fuyang Xu, Yimin Lou, Bing Cao, and Guiju Zhang "Nanostructure photolithography based on surface plasmonic interference", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 841814 (15 October 2012); https://doi.org/10.1117/12.977310

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KEYWORDS

Polarization

Diffraction

Nanostructures

Interferometry

Optical lithography

Surface plasmons

Plasmonics

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