Paper
15 October 2012 Aliasing in a Hartmann wavefront sensor at x-ray wavelengths
Author Affiliations +
Abstract
The Hartmann Sensor is a simple and well-established method to interrogate wavefront quality. Recently the Hartmann sensor has been used at very short wavelengths, including the extreme UV. Here we consider the Hartmann sensor and its ability to measure the wavefront of an x-ray beam. We use both analytic methods and a wave-optics, Fresnel-diffraction simulation. The Hartmann sensor samples the wavefront, which means that it is susceptible to aliasing (the non-linear phenomenon where high-spatial frequency components are incorrectly measured as low-spatial frequency components). Our analysis shows that aliasing is more severe in the Hartmann sensor than in the corresponding (optical) Shack-Hartmann. Aliasing worsens as Hartmann hole size shrinks. The wave-optics simulations show that for reasonable optics-polishing errors and Hartmann mask design, aliasing errors can be of the same magnitude as the phase that is to be measured.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lisa A. Poyneer, Brian Bauman, and Bruce Macintosh "Aliasing in a Hartmann wavefront sensor at x-ray wavelengths", Proc. SPIE 8503, Adaptive X-Ray Optics II, 85030I (15 October 2012); https://doi.org/10.1117/12.946116
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Sensors

Wavefronts

Spatial frequencies

Error analysis

Wavefront sensors

Polishing

Phase measurement

Back to Top