Paper
15 October 2012 Modeling of photodependent capacitance for short gate-length ion-implanted GaAs MESFETs
Shweta Tripathi, S. Jit
Author Affiliations +
Proceedings Volume 8549, 16th International Workshop on Physics of Semiconductor Devices; 85492L (2012) https://doi.org/10.1117/12.924519
Event: 16th International Workshop on Physics of Semiconductor Devices, 2011, Kanpur, India
Abstract
This paper presents an analytical model for C-V characteristics of short gate-length GaAs MESFET under illuminated condition. The non-analytic Gaussian doping profile commonly considered for the channel doping of an ion-implanted GaAs MESFET has been replaced by an analytic Gaussian-like function for the simplicity of the present model. When the computed results of the proposed model are compared with numerical simulation data obtained by ATLAS™ device simulator, an encouraging correspondence between the two lends credibility to our model.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shweta Tripathi and S. Jit "Modeling of photodependent capacitance for short gate-length ion-implanted GaAs MESFETs", Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 85492L (15 October 2012); https://doi.org/10.1117/12.924519
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Gallium arsenide

Field effect transistors

Capacitance

Doping

Instrument modeling

Data modeling

Computer simulations

RELATED CONTENT


Back to Top