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30 January 2013 A simplified model for HF chemical laser amplifier
Wenguang Liu, Xing Chen, Hongyan Wang, WeiHong Hua
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Proceedings Volume 8677, XIX International Symposium on High-Power Laser Systems and Applications 2012; 867713 (2013) https://doi.org/10.1117/12.2009491
Event: XIX International Symposium on High-Power Laser Systems and Applications, 2012, Istanbul, Turkey
Abstract
]HF chemical laser with MOPA configuration is a good solution to achieve high output power with high reliability. Kinetic models for HF amplifier are important for prediction and optimization of the performance of MOPA chemical lasers. In this paper, a simplified model for HF chemical laser amplifier is presented. The main processes which are included in the model are: (a) chemical pumping of HF (v=2) and HF (v=1), (b) stimulated transitions and spontaneous emission. (c) relaxation of vibration excited HF molecule by H2,N2 and HF. Some assumptions are taken in this model: (a) the density of H2, N2, HF, translational temperature and velocity of gas mixture are averaged across the laser cross section, (b) only two vibration-rotational transitions (2P6, 1P7) occurs in the amplifier, (c) gas temperature does not change during the lasing process in the amplifier. Based on these assumptions, a set of three-level rate equations is formulated and then solved by an iterative technique. Comparison is made with recent experimentally obtained data from a low power discharge-driven CW HF laser with MOPA configuration. It is shown that experimental results are consistent with the calculation from the simplified model.
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Wenguang Liu, Xing Chen, Hongyan Wang, and WeiHong Hua "A simplified model for HF chemical laser amplifier", Proc. SPIE 8677, XIX International Symposium on High-Power Laser Systems and Applications 2012, 867713 (30 January 2013); https://doi.org/10.1117/12.2009491
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KEYWORDS
Hydrogen fluoride lasers
Amplifiers
Chemical lasers
Optical amplifiers
Continuous wave operation
Oscillators
Molecules
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