High resolution technology for FPD lithography tools

Nobuhiko Yabu; Yoshiyuki Nagai; Satoshi Tomura; Tomohiro Yoshikawa

doi:10.1117/12.2028215

28 June 2013 High resolution technology for FPD lithography tools

Nobuhiko Yabu, Yoshiyuki Nagai, Satoshi Tomura, Tomohiro Yoshikawa

Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010I (2013) https://doi.org/10.1117/12.2028215
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan

Abstract

As the resolution of LCD panels adapted for Smartphone and Tablet PC rapidly becomes higher, the performance needed for lithography tools to produce them also becomes higher than ever. To respond to such needs, we have developed new lithography tools for mass production of high resolution LCD panels. We have executed various exposure tests to evaluate their performance. In this paper, we present the results of these tests. By employing higher NA projection optics, high resolution (2.0μm and under) has been achieved. We also present the effect of special illumination and the difference in profile between kinds of photoresist. Furthermore, we also refer what will be needed for masks and blanks in the next generation. To achieve even higher resolution, it is necessary for masks and blanks to have high flatness, low level of defects and small linewidth error.

Citation Download Citation

Nobuhiko Yabu, Yoshiyuki Nagai, Satoshi Tomura, and Tomohiro Yoshikawa "High resolution technology for FPD lithography tools", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010I (28 June 2013); https://doi.org/10.1117/12.2028215

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