High-refractive-index gratings for spectroscopic and laser applications

Uwe D. Zeitner; Frank Fuchs; E.-Bernhard Kley; Andreas Tünnermann

doi:10.1117/12.2041729

19 February 2014 High-refractive-index gratings for spectroscopic and laser applications

Uwe D. Zeitner, Frank Fuchs, E.-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8995, High Contrast Metastructures III; 899504 (2014) https://doi.org/10.1117/12.2041729
Event: SPIE OPTO, 2014, San Francisco, California, United States

Abstract

Fabrication of high performance gratings may significantly benefit from the use of high index materials such as Ta₂O₅, TiO ₂ or Al₂O₃. However, these materials can typically not be patterned with the required quality by common etching processes. To overcome this limitation we developed novel grating fabrication technologies based on a combination of conventional lithography with Atomic-Layer-Deposition. For that the basic structure of the grating is first realized in a fused-silica substrate or a SiO₂-layer. This template is then functionalized by an ALD-coating in a specific pre-defined manner. The new approach opens up a huge variety of new options for the realization of gratings whose fabrication would otherwise not be possible.

Citation Download Citation

Uwe D. Zeitner, Frank Fuchs, E.-Bernhard Kley, and Andreas Tünnermann "High-refractive-index gratings for spectroscopic and laser applications", Proc. SPIE 8995, High Contrast Metastructures III, 899504 (19 February 2014); https://doi.org/10.1117/12.2041729

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