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The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from this book: Author(s), “Title of Paper,” in Optical Micro- and Nanometrology V, edited by Christophe Gorecki, Anand Krishna Asundi, Wolfgang Osten, Proceedings of SPIE Vol. 9132 (SPIE, Bellingham, WA, 2014) Article CID Number. ISSN: 0277-786X ISBN: 9781628410808 Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2014, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/14/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library.
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IntroductionSurvival in the highly competitive process industries is largely dependent on the optimisation of product performance, component quality control, and the production of high-quality economic parts. With increased competition in the present economic climate, investigations into new advanced techniques to improve product quality and cost reduction are essential. In addition, over the recent years, micro-components as part of micro-manufacturing processes are becoming increasingly relevant. Such micro components/systems are key in improving the capabilities and performances of next generation products. However, compared to manufacturing processes at the micro- and nano-meter level, the ability to control, measure and characterise such dimensional features in 3D needs to be further developed. Optical micro- and nano-metrology are key technologies that need proper consideration to address the issue. Associated research focuses on the design, development and evaluation at nanometer scales of both specific procedures and instrumentation to leverage research aspects as well as improve the mass production of micro-and nano-manufacturing products. This volume contains the proceeding of the sixth conference on Optical Micro- and Nanometrology, Photonics Europe, dedicated to optical inspection methods and developments in nano- and micro-measurements. (The volume is titled, “Optical Micro- and Nonometrology V” due to an earlier title change.) The conference contains 8 oral sessions and one poster session on Micro- and nanometrology, including Profilometry and Surface Measurement, Scatterometry, Nanoscale Metrology, Traceability and Sensitivity Enhancement, Optical Microscopy and Tomography, Phase Reconstruction, Optical Surface and Volume Metrology and New Interferometric Techniques sessions. We would like to thank the members of scientific program committee for their fine efforts. Finally, we thank the authors for their excellent contributions and the SPIE staff for their support of this conference. Christophe Gorecki Wolfgang Osten Anand Krishna Asundi |
