Simultaneous determination of thickness and refractive indices of birefringent wafer by simple transmission measurement

Hee Joo Choi; Jun Yeol Ryu; Myoungsik Cha

doi:10.1117/12.2063280

18 August 2014 Simultaneous determination of thickness and refractive indices of birefringent wafer by simple transmission measurement

Hee Joo Choi, Jun Yeol Ryu, Myoungsik Cha

Author Affiliations +

Proceedings Volume 9203, Interferometry XVII: Techniques and Analysis; 920309 (2014) https://doi.org/10.1117/12.2063280
Event: SPIE Optical Engineering + Applications, 2014, San Diego, California, United States

Abstract

We demonstrate a method for determining the principal indices of refraction and the thickness of a birefringent wafer. Simply, the light transmittance was measured while rotating the wafer. The directly transmitted beam makes interference with those multiply reflected between the surfaces as in a Fabry-Pérot etalon, producing an interferogram as a function of angle of incidence. We applied this method to a LiNbO₃ wafer, determining the absolute values of ordinary and extraordinary indices with an uncertainty of 10^-5. In addition to the measurement accuracy, the major advantages of our method are extreme simplicity and environmental robustness in the experiment.

Citation Download Citation

Hee Joo Choi, Jun Yeol Ryu, and Myoungsik Cha "Simultaneous determination of thickness and refractive indices of birefringent wafer by simple transmission measurement", Proc. SPIE 9203, Interferometry XVII: Techniques and Analysis, 920309 (18 August 2014); https://doi.org/10.1117/12.2063280

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