Paper
13 November 2014 New method of verificating optical flat flatness
Hao Sun, Xueyuan Li, Sen Han, Jianrong Zhu, Zhenglai Guo, Yuegang Fu
Author Affiliations +
Abstract
Optical flat is commonly used in optical testing instruments, flatness is the most important parameter of forming errors. As measurement criteria, optical flat flatness (OFF) index needs to have good precision. Current measurement in China is heavily dependent on the artificial visual interpretation, through discrete points to characterize the flatness. The efficiency and accuracy of this method can not meet the demand of industrial development. In order to improve the testing efficiency and accuracy of measurement, it is necessary to develop an optical flat verification system, which can obtain all surface information rapidly and efficiently, at the same time, in accordance with current national metrological verification procedures. This paper reviews current optical flat verification method and solves the problems existing in previous test, by using new method and its supporting software. Final results show that the new system can improve verification efficiency and accuracy, by comparing with JJG 28-2000 metrological verification procedures method.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hao Sun, Xueyuan Li, Sen Han, Jianrong Zhu, Zhenglai Guo, and Yuegang Fu "New method of verificating optical flat flatness ", Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 92760Y (13 November 2014); https://doi.org/10.1117/12.2071461
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Metrology

Interferometers

Optics manufacturing

Optical testing

Photovoltaics

Wavefronts

Calibration

Back to Top