Effect of illumination parameters on the quality of wavefront diffracted by pinhole

Gongming Ding; Yuejing Qi; Zengxiong Lu; Guangyi Liu

doi:10.1117/12.2068292

18 September 2014 Effect of illumination parameters on the quality of wavefront diffracted by pinhole

Gongming Ding, Yuejing Qi, Zengxiong Lu, Guangyi Liu

Proceedings Volume 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 92821U (2014) https://doi.org/10.1117/12.2068292
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China

Abstract

High quality spherical wave, which is typically generated by the pinhole diffraction, is the core for calibration of the high-accuracy wavefront testing. The quality of the spherical wave diffracted by the pinhole is mainly determined by pinhole’s thickness, diameter, shape, material and illumination parameters. In this paper, we analyze the effect of illumination parameters such as the aberrations and numerical aperture (NA) on the quality of the spherical wave diffracted by the pinhole based on finite difference time domain (FDTD) method. The results show that the wavefront error of the spherical wave is about 8.4E-4 λ RMS when the NA of the illumination light is 0.75 and the diameter of the pinhole is 200 nm. Wavefront error of the diffracted spherical wave increases as the NA of the aberrant illumination beam increasing. Compare with astigmatism, defocus and spherical aberration, coma has the largest effect on the wavefront quality and is the most difficult aberration to filter. The conclusion supports important reference for determining the illumination parameters in calibration of high accuracy wavefront testing system.

Citation Download Citation

Gongming Ding, Yuejing Qi, Zengxiong Lu, and Guangyi Liu "Effect of illumination parameters on the quality of wavefront diffracted by pinhole", Proc. SPIE 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 92821U (18 September 2014); https://doi.org/10.1117/12.2068292

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KEYWORDS

Wavefronts

Spherical lenses

Monochromatic aberrations

Wavefront sensors

Calibration

Finite-difference time-domain method

Spatial filters

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