Transient tip-sample interactions in high-speed AFM imaging of 3D nano structures

Aliasghar Keyvani; Hamed Sadeghian; Hans Goosen; Fred van Keulen

doi:10.1117/12.2185848

10 April 2015 Transient tip-sample interactions in high-speed AFM imaging of 3D nano structures

Aliasghar Keyvani, Hamed Sadeghian, Hans Goosen, Fred van Keulen

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94242Q (2015) https://doi.org/10.1117/12.2185848
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The maximum amount of repulsive force applied to the surface plays a very important role in damage of tip or sample in Atomic Force Microscopy(AFM). So far, many investigations have focused on peak repulsive forces in tapping mode AFM in steady state conditions. However, it is known that AFM could be more damaging in transient conditions. In high-speed scanning, and in presence of 3D nano structures (such as FinFET), the changes in topography appear in time intervals shorter than the response time of the cantilever. In this case, the tip may crush into the sample by exerting much higher forces than for the same cantilever-sample distance in steady state situations. In this study the effects of steep upward steps in topography on the tip-sample interactions have been investigated, and it has been found that the order(s) of magnitude higher forces can be applied. The information on the worst case scenario obtained by this method can be used for selection of operation parameters and probe design to minimize damage in high-speed imaging. The numerically obtained results have been verified with the previous works in steady state regime. Based on this investigation the maximum safe scanning speed has been obtained for a case study.

Citation Download Citation

Aliasghar Keyvani, Hamed Sadeghian, Hans Goosen, and Fred van Keulen "Transient tip-sample interactions in high-speed AFM imaging of 3D nano structures", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242Q (10 April 2015); https://doi.org/10.1117/12.2185848

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