Paper
21 May 2015 Development of silicon microforce sensors integrated with double meander springs for standard hardness test instruments
Hutomo Suryo Wasisto, Lutz Doering, Alwin Daus, Uwe Brand, Thomas Frank, Erwin Peiner
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Abstract
Silicon microforce sensors, to be used as a transferable standard for micro force and depth scale calibrations of hardness testing instruments, are developed using silicon bulk micromachining technologies. Instead of wet chemical etching, inductively coupled plasma (ICP) cryogenic deep reactive ion etching (DRIE) is employed in the sensor fabrication process leading to more precise control of 300 μm deep structures with smooth sidewall profiles. Double meander springs are designed flanking to the boss replacing the conventional rectangular springs and thereby improving the system linearity. Two full p-SOI piezoresistive Wheatstone bridges are added on both clamped ends of the active sensors. To realize passive force sensors two spring-mass elements are stacked using glue and photoresist as joining materials. Correspondingly, although plastic deformation seems to occur when the second spring is contacted, the kink effect (i.e., abrupt increase of stiffness) is obviously observed from the first test of the passive stack sensor.
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Hutomo Suryo Wasisto, Lutz Doering, Alwin Daus, Uwe Brand, Thomas Frank, and Erwin Peiner "Development of silicon microforce sensors integrated with double meander springs for standard hardness test instruments", Proc. SPIE 9517, Smart Sensors, Actuators, and MEMS VII; and Cyber Physical Systems, 95171X (21 May 2015); https://doi.org/10.1117/12.2180117
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Cited by 2 scholarly publications.
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KEYWORDS
Sensors

Silicon

Wheatstone bridges

Deep reactive ion etching

Etching

Active sensors

Standards development

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