Paper
4 March 2016 Photochemical reduction of graphene oxide (GO) by femtosecond laser irradiation
Author Affiliations +
Proceedings Volume 9736, Laser-based Micro- and Nanoprocessing X; 973617 (2016) https://doi.org/10.1117/12.2211583
Event: SPIE LASE, 2016, San Francisco, California, United States
Abstract
In this study, we demonstrated a facile method for the reduction of graphene oxide (GO) by applying femtosecond laser pulse irradiation in aqueous colloidal solution. Utilization of femtosecond (fs) laser pulse irradiation enabled us to control GO reduction by adjusting laser fluence and irradiation time. The formation of reduced graphene oxide (rGO) was induced by solvated electrons generated through laser irradiation of colloidal GO solution, which was confirmed by means of UV-visible and Raman spectroscopy, XPS and XRD. By applying an optimum femtosecond laser condition, the interplanar spacing between carbon layers decreased significantly from 9.81 Å to 3.52Å indicating the effective removal of oxygen-containing groups from the basal plane of GO. Furthermore, the sheet resistivity of the fabricated rGO in disk form was 1,200 times lower than GO.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Muttaqin, Takahiro Nakamura, and Shunichi Sato "Photochemical reduction of graphene oxide (GO) by femtosecond laser irradiation", Proc. SPIE 9736, Laser-based Micro- and Nanoprocessing X, 973617 (4 March 2016); https://doi.org/10.1117/12.2211583
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Graphene

Femtosecond phenomena

Laser irradiation

Carbon

Hydrogen

Laser therapeutics

Raman spectroscopy

Back to Top