Presentation
11 November 2022 Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle
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Abstract
As the EUV source power increases, the industry requires new pellicle materials with high EUV transmittance and chemical stability under EUV irradiation environments. We demonstrate a molybdenum carbide (Mo2C) membrane as a new pellicle material which exhibits high EUV transmittance (≥ 88 %). The stability of Mo2C membranes was confirmed under high temperature and hydrogen plasma. Through this study, the possibility of Mo2C as a candidate material for EUV pellicle was confirmed.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongkyung Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, and Jinho Ahn "Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920H (11 November 2022); https://doi.org/10.1117/12.2643003
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KEYWORDS
Pellicles

Extreme ultraviolet lithography

Extreme ultraviolet

Molybdenum

Hydrogen

Photomasks

Transmittance

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