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Extreme ultraviolet (EUV) lithography sources use large amounts of tin to create ultraviolet light. Accurate modeling of neutral tin transport relies on knowledge of the diffusion coefficients of neutral tin through molecular hydrogen. This work experimentally determined the diffusion coefficients of tin through molecular hydrogen at different tin temperatures and ambient pressures. A known amount of tin is evaporated into a pipe with a known flow profile at a known ambient pressure. Deposited tin is measured down stream of the pipe with a quartz-crystal microbalance (QCM). A variety of analytical and numerical coefficients were then compared in order to find the diffusion coefficient.
Gordon Jameson Crouse,Gavin McCoy,Nathan Bartlett, andAndrew Herschberg
"Measurement of tin diffusion coefficients through molecular hydrogen", Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC124940O (14 April 2023); https://doi.org/10.1117/12.2663094
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Gordon Jameson Crouse, Gavin McCoy, Nathan Bartlett, Andrew Herschberg, "Measurement of tin diffusion coefficients through molecular hydrogen," Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC124940O (14 April 2023); https://doi.org/10.1117/12.2663094