EUV Light Source for Lithography

Book: Photon Sources for Lithography and Metrology

Editor(s): Vivek Bakshi

Chapter Author(s): Hakaru Mizoguchi, Akira Endo, Yutaka Shiraishi, Tatsuya Yanagida, Shinji Nagai, Takashi Suganuma, Krzysztof Nowak, Georg Soumagne, Hiroaki Nakarai, Yoshifumi Ueno, Takashi Saito, Toshihiro Oga

Published: 2023

https://doi.org/10.1117/3.2638242.ch7

Author Affiliations +

Abstract

Extreme-ultraviolet (EUV) lithography uses EUV light of an extremely short wavelength of 13.5 nm. This allows for exposure of fine circuit patterns with a half-pitch below 20 nm that cannot be exposed by the conventional optical lithography using an ArF excimer laser (Table 7.1).