Optimization of directed self-assembly hole shrink process with simplified model

Kenji Yoshimoto; Ken Fukawatase; Masahiro Ohshima; Yoshihiro Naka; Shimon Maeda; Satoshi Tanaka; Seiji Morita; Hisako Aoyama; Shoji Mimotogi

doi:10.1117/1.JMM.13.3.031305

7 August 2014 Optimization of directed self-assembly hole shrink process with simplified model

Kenji Yoshimoto, Ken Fukawatase, Masahiro Ohshima, Yoshihiro Naka, Shimon Maeda, Satoshi Tanaka, Seiji Morita, Hisako Aoyama, Shoji Mimotogi

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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 3, 031305 (August 2014). https://doi.org/10.1117/1.JMM.13.3.031305

Abstract

Application of the directed self-assembly of block copolymer to the hole shrink process has gained large attention because of the low cost and high potential for sublithographic patterning. In this study, we have employed a simplified model, called the Ohta-Kawasaki model to find the optimal process conditions, which minimize the morphological defects of the diblock copolymer, PS-b-PMMA. The model parameters were calibrated with cross-sectional transmission electron microscopy images. Our simulation results revealed that it is difficult to eliminate the morphological defects (i.e., PS residual layer) by only varying the shape of the guide hole. It turned out that changing the affinity of the bottom surface of the guide hole from “PMMA attractive” to “neutral” is a more effective way to obtain a reasonably wide, defect-free process window. Note that our simulations are not only computationally inexpensive, but are also comparable to the other detailed models such as the self-consistent field theory; they may also be feasible for large-scale simulations such as the hotspot analysis over a large area.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Kenji Yoshimoto, Ken Fukawatase, Masahiro Ohshima, Yoshihiro Naka, Shimon Maeda, Satoshi Tanaka, Seiji Morita, Hisako Aoyama, and Shoji Mimotogi "Optimization of directed self-assembly hole shrink process with simplified model," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 031305 (7 August 2014). https://doi.org/10.1117/1.JMM.13.3.031305

Published: 7 August 2014

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