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29 June 2016 Special Section Guest Editorial:Extending VLSI and Alternative Technology with Optical and Complementary Lithography
Kafai Lai, Andreas Erdmann
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 2, 021201 (June 2016). https://doi.org/10.1117/1.JMM.15.2.021201
This PDF file contains the editorial “Special Section Guest Editorial:Extending VLSI and Alternative Technology with Optical and Complementary Lithography” for JM3 Vol. 15 Issue 02
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
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Kafai Lai and Andreas Erdmann "Special Section Guest Editorial:Extending VLSI and Alternative Technology with Optical and Complementary Lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021201 (29 June 2016). https://doi.org/10.1117/1.JMM.15.2.021201
Published: 29 June 2016
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KEYWORDS
Lithography
Optical lithography
3D modeling
Very large scale integration
Photomasks
Extreme ultraviolet
Extreme ultraviolet lithography
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