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4 March 2016 Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns
Masato Shibuya, Akira Takada, Toshiharu Nakashima
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 2, 021206 (March 2016). https://doi.org/10.1117/1.JMM.15.2.021206
Abstract
In optical lithography, high-performance exposure tools are indispensable to obtain not only fine patterns but also preciseness in pattern width. Since an accurate theoretical method is necessary to predict these values, some pioneer and valuable studies have been proposed. However, there might be some ambiguity or lack of consensus regarding the treatment of diffraction by object, incoming inclination factor onto image plane in scalar imaging theory, and paradoxical phenomenon of the inclined entrance plane wave onto image in vector imaging theory. We have reconsidered imaging theory in detail and also phenomenologically resolved the paradox. By comparing theoretical aerial image intensity with experimental pattern width for one-dimensional pattern, we have validated our theoretical consideration.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
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Masato Shibuya, Akira Takada, and Toshiharu Nakashima "Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021206 (4 March 2016). https://doi.org/10.1117/1.JMM.15.2.021206
Published: 4 March 2016
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Cited by 5 scholarly publications.
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KEYWORDS
Image processing
Projection systems
Fourier transforms
Optical spheres
Diffraction
Photomasks
Wave propagation
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