Three-dimensional patterning in polymer optical waveguides using focused ion beam milling

Kevin Kruse; Derek Burrell; Christopher Middlebrook

doi:10.1117/1.JMM.15.3.034505

12 August 2016 Three-dimensional patterning in polymer optical waveguides using focused ion beam milling

Kevin Kruse, Derek Burrell, Christopher Middlebrook

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 3, 034505 (August 2016). https://doi.org/10.1117/1.JMM.15.3.034505

Abstract

Waveguide (WG) photonic-bridge taper modules are designed for symmetric planar coupling between silicon WGs and single-mode fibers (SMFs) to minimize photonic chip and packaging footprint requirements with improving broadband functionality. Micromachined fabrication and evaluation of polymer WG tapers utilizing high-resolution focused ion beam (FIB) milling is performed and presented. Polymer etch rates utilizing the FIB and optimal methods for milling polymer tapers are identified for three-dimensional patterning. Polymer WG tapers with low sidewall roughness are manufactured utilizing FIB milling and optically tested for fabrication loss. FIB platforms utilize a focused beam of ions (Ga⁺) to etch submicron patterns into substrates. Fabricating low-loss polymer WG taper prototypes with the FIB before moving on to mass-production techniques provides theoretical understanding of the polymer taper and its feasibility for connectorization devices between silicon WGs and SMFs.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Kevin Kruse, Derek Burrell, and Christopher Middlebrook "Three-dimensional patterning in polymer optical waveguides using focused ion beam milling," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(3), 034505 (12 August 2016). https://doi.org/10.1117/1.JMM.15.3.034505

Published: 12 August 2016

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