Laser-damage growth characteristics of fused silica under 1064- and 532-nm laser irradiation

Bin Ma; Hongping Ma; Hongfei Jiao; Xinbin Cheng; Zhanshan Wang

doi:10.1117/1.OE.52.11.116106

12 November 2013 Laser-damage growth characteristics of fused silica under 1064- and 532-nm laser irradiation

Bin Ma, Hongping Ma, Hongfei Jiao, Xinbin Cheng, Zhanshan Wang

Author Affiliations +

Optical Engineering, Vol. 52, Issue 11, 116106 (November 2013). https://doi.org/10.1117/1.OE.52.11.116106

Abstract

The laser-damage growth characteristics of initial damage sites play an important role in investigating the laser-induced damage mechanisms and determining the lifetime of the optics in application. We investigate the damage growth behaviors of fused silica under 1064, and 532-nm nanosecond-pulsed laser irradiation. The relationships between the sizes of initial damage sites and the laser fluence, as well as the initial damage morphology evolutions and the laser shot numbers, are discussed. Moreover, the growth characteristics of the initial damage sites generated by the same fluence but under different subsequent fluence irradiation are compared with those of initial damage sites generated by different fluence but under the same subsequent fluence irradiation. Finally, the differences between the damage morphologies and the growth features at the same conditions under different wavelengths are also provided and discussed.

Citation Download Citation

Bin Ma, Hongping Ma, Hongfei Jiao, Xinbin Cheng, and Zhanshan Wang "Laser-damage growth characteristics of fused silica under 1064- and 532-nm laser irradiation," Optical Engineering 52(11), 116106 (12 November 2013). https://doi.org/10.1117/1.OE.52.11.116106

Published: 12 November 2013

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