A four-step laser interference lithography for patterning pixelated micro-polarizer array

Fuyuan Deng; Tianshi Lu; Qihang Zhai; Linbin Luo; Gaopeng Xue; Qian Zhou; Xiaohao Wang; Xinghui Li

doi:10.1117/12.2643872

19 December 2022 A four-step laser interference lithography for patterning pixelated micro-polarizer array

Fuyuan Deng, Tianshi Lu, Qihang Zhai, Linbin Luo, Gaopeng Xue, Qian Zhou, Xiaohao Wang, Xinghui Li

Proceedings Volume 12318, Holography, Diffractive Optics, and Applications XII; 123182F (2022) https://doi.org/10.1117/12.2643872
Event: SPIE/COS Photonics Asia, 2022, Online Only

Abstract

Pixelated micro-polarizer array is an attractive polarization imaging device because of its real-time fully detecting capability to Stokes parameters and high integration level. However, this micro-device is commonly fabricated by electron beam lithography, thus is often high-cost. Since periodic unit of this device is a 2×2 array of four types of one-dimensional (1D) gratings with different orientations (0°, 45°, 90°, 135°), a low-cost grating fabrication technique, interference lithography (IL), is possible to be used to fabricate this device. In this research, a four-steps exposure patterning method of micro-polarizer array based on single Lloyd’s mirror interferometer IL is developed. This interferometer is composed by two perpendicular parts: a mirror and a photoresist holder, and a 1D grating parallel with mirror can be fabricated in the exposure region on photoresist through lithography. A Cr-based mask, whose transparent pattern is a square array of square windows with 15×15 μm2 window size and 17 μm window spacing, is introduced and clamped onto the photoresist to cut exposure region. In four exposure steps, each 15×15 μm2 quadrant area of a polarizer array with 2 μm quadrant spacing will be exposed on photoresist, respectively. Between two exposure steps, mask and photoresist substrate need to be simultaneously horizontal rotated, to adjust the orientation of grating fabricated in next exposed quadrant on photoresist. Based on this method, we fabricated the single-state patterned micro-polarizer array, which effectively controls the cost and fabrication cycle. The experimental results show that the photoresist grating within a single window has stable structure, uniform period and good directivity.

Conference Presentation

Citation Download Citation

Fuyuan Deng, Tianshi Lu, Qihang Zhai, Linbin Luo, Gaopeng Xue, Qian Zhou, Xiaohao Wang, and Xinghui Li "A four-step laser interference lithography for patterning pixelated micro-polarizer array", Proc. SPIE 12318, Holography, Diffractive Optics, and Applications XII, 123182F (19 December 2022); https://doi.org/10.1117/12.2643872

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