Improved resist profiles and CD control through optimized thin dielectric stacks

Christopher F. Lyons; Mahesh Agrawal; Bhanwar Singh

doi:10.1117/12.210381

9 June 1995 Improved resist profiles and CD control through optimized thin dielectric stacks

Christopher F. Lyons, Mahesh Agrawal, Bhanwar Singh

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210381
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

LOCOS processes use nitride layers in the range of 1000 - 2000 angstrom for oxidation barriers. The thicknesses are optimized for the stiffness needed to control the `bird's beak' and for stress which effects the subsequent gate oxide quality. We have found that CD control is generally poor on the active mask and that the resist profile is prone to `footing.' Simulation and experiments have shown that resist footing is dependent on the exposure dose at the resist/nitride interface. This, in turn, depends on the nitride thickness. This resist foot is not reproducible because of normal variations in the nitride thickness and it introduces CD variation. In addition the foot may produce problems with the nitride etch and contributes to the resist to final etched CD bias. Here we report on studies of the effect of nitride thickness on active masking. Optimizing the LOCOS film stack results in improved resist profiles and CD control.

Citation Download Citation

Christopher F. Lyons, Mahesh Agrawal, and Bhanwar Singh "Improved resist profiles and CD control through optimized thin dielectric stacks", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210381

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
16 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Picture Archiving and Communication System

Critical dimension metrology

Oxides

Semiconducting wafers

Diffusion

Etching

Interfaces

Show All Keywords

Keywords/Phrases

Search In:

Publication Years