Pulsed laser deposition of nanostructured carbon films for field emission

Anatoly V. Rodin; E. A. Ekimov; Dmitry A. Mazalov; Alexander F. Pal; Valery V. Pichugin; Nikolay V. Suetin

doi:10.1117/12.537503

14 November 2003 Pulsed laser deposition of nanostructured carbon films for field emission

Anatoly V. Rodin, E. A. Ekimov, Dmitry A. Mazalov, Alexander F. Pal, Valery V. Pichugin, Nikolay V. Suetin

Proceedings Volume 5147, ALT'02 International Conference on Advanced Laser Technologies; (2003) https://doi.org/10.1117/12.537503
Event: ALT'02 International Conference on Advanced laser Technologies, 2002, Adelboden, Switzerland

Abstract

The technology of target production was developed and the regimes of their irradiation was determined. The investigation was made of electrofield emission characteristics of thin nanodiamond and glassy carbon films deposited by laser ablation of diamond and glassy carbon targets. X-ray analysis and Raman spectroscopy showed that there was no phase change in the target substance during the process of the target substance deposition upon the substrate. Emission currents up to 10 mA/cm² in the field of 20 V/μm were obtained. The numerical simulation of temperatire fields distribution in the target material was carried out.

Citation Download Citation

Anatoly V. Rodin, E. A. Ekimov, Dmitry A. Mazalov, Alexander F. Pal, Valery V. Pichugin, and Nikolay V. Suetin "Pulsed laser deposition of nanostructured carbon films for field emission", Proc. SPIE 5147, ALT'02 International Conference on Advanced Laser Technologies, (14 November 2003); https://doi.org/10.1117/12.537503

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