PROCEEDINGS VOLUME 0632
1986 MICROLITHOGRAPHY CONFERENCES | 10-12 MARCH 1986
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
Editor(s): Phillip D. Blais
Editor Affiliations +
IN THIS VOLUME

1 Sessions, 33 Papers, 0 Presentations, 0 Posters
All Papers  (33)
1986 MICROLITHOGRAPHY CONFERENCES
10-12 March 1986
Santa Clara, United States
All Papers
Bob Carlson, Dan Burbank
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963662
Jorge L. Freyer, Robert M. Sills
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963663
Kenneth A. Barnett, Robert A. Metzger, Oberdan W. Otto
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963664
H. Nozue, H. Yamanaka, S. Hasegawa, Y. Iida
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963665
M. E. Roulet, Y. Oppliger, L. Stauffer, H. Luginbahl, L. Fontijn, M. van der Kraan
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963666
Michael E. Haslam, John F. McDonald
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963667
Kenj i Gamo, Yukinori Ochiai, Kazuhiko Shioyama, Susumu Namba
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963668
Henry C. Kaufmann, William B. Thompson, Gregory J. Dunn
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963669
H. Betz, A. Heuberger, N. P. Economou, D . C. Shaver
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963670
N.William Parker, William P. Robinson, Joseph M. Snyder
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963671
W. Thompson, T. Bowe, S Morlock, A. Moskowitz, G . Plourde, G Spaulding, C. Scialdone, E. Tsiang
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963672
K. D Cummings, L. R. Harriott, G. c. Chi, F. W. Ostermayer Jr.
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963673
Masahiro Yamamoto, Mitsuyoshi Sato, Hideaki Kyogoku, Kazuo Aita, Yoshitomo Nakagawa, Anto Yasaka, Ryohji Takasawa, Osamu Hattori
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963674
A. R. Shimkunas, J. J. LaBrie, P. E. Mauger, J. J. Yen
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963675
Arnold W. Yanof, Douglas J. Resnick, Constance A. Jankoski, William A. Johnson
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963676
Hideo Yoshihara, Ikuo Okada, Yasunao Saitoh, Seiichi Itabashi
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963677
K. Suzuki, J. Matsui, K. Okada, N. Endo, Y. Iida
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963678
B. S. Fay, W. T. Novak
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963679
R . B. McIntosh Jr., G P. Hughes, J L Kreuter, G R Conti Jr.
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963680
Akiyoshi Suzuki, Ryusho Hirose, Youichi Hirabayashi
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963681
Tadahiro Takigawa, Kuniya Shimazaki, Naoki Kusui
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963682
Yoshihiro Todokoro, Hiroshi Yamashita, Yuki Yaegashi
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963683
Yasuo Bamba, Eizo Miyauchi, Hiroshi Arimoto, Tetsuo Morita, Akira Takamori, Hisao Hashimoto
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963684
R. Aihara, H. Sawaragi, H. Morimoto, T. Kato
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963685
T. Kato, K. Saitoh, S. Takeuchi, K. Moriizumi, K. Shibayama
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963686
L. A. Fontijn, H. J. van Agthoven, M. R. van der Kraan
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963687
David P. Paul
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963688
Yasuo Furukawa, Yoshiro Goto, Toshihiro Ishizuka, Kazuo Ookubo, Takefumi Inagaki
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963689
Kazumitsu Nakamura, Akira Yanagisawa, Yoshio Sakitani, Tsutomu Komoda
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963690
Huayu Liu, E. D. Liu
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963691
L. M. Schiavone, H. G. Craighhead
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963692
Andrew M. Hawryluk
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963693
Renato Redaelli, Roman Tatchyn, Piero Pianetta
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V, (1986) https://doi.org/10.1117/12.963694
Back to Top