Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for sub-20nm metal routing

Lynn T. - N. Wang; Uwe Paul Schroeder; Sriram Madhavan

doi:10.1117/12.2258061

30 March 2017 Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for sub-20nm metal routing

Lynn T. - N. Wang, Uwe Paul Schroeder, Sriram Madhavan

Author Affiliations +

Proceedings Volume 10148, Design-Process-Technology Co-optimization for Manufacturability XI; 1014804 (2017) https://doi.org/10.1117/12.2258061
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

A pattern-based methodology for optimizing SADP-compliant layout designs is developed based on identifying cut mask patterns and replacing them with pre-characterized fixing solutions. A pattern-based library of difficult-tomanufacture cut patterns with pre-characterized fixing solutions is built. A pattern-based engine searches for matching patterns in the decomposed layouts. When a match is found, the engine opportunistically replaces the detected pattern with a pre-characterized fixing solution. The methodology was demonstrated on a 7nm routed metal2 block. A small library of 30 cut patterns increased the number of more manufacturable cuts by 38% and metal-via enclosure by 13% with a small parasitic capacitance impact of 0.3%.

Conference Presentation

Citation Download Citation

Lynn T. - N. Wang, Uwe Paul Schroeder, and Sriram Madhavan "Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for sub-20nm metal routing", Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 1014804 (30 March 2017); https://doi.org/10.1117/12.2258061

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