Poster + Paper
3 October 2022 Machine vision system for alignment in die-to-wafer bonder
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Conference Poster
Abstract
In this paper, we suggested an alignment mark measurement system for die-to-wafer bonder. The system consisted of a vision system to measure the positions of alignment marks on die and wafer opposite to each other, and a height measurement system to detect the heights of the die and wafer to the vision system. Besides them, a tilt measurement system was also attached to check the parallelism between the die and wafer for exact measurement and bonding. For high precision measurement, the vision system used a special prism structure which minimized the distance between the die and wafer and measured alignment marks on both sides simultaneously. A focus tunable lens was also applied to control a focus position without changing the height of the system. We have designed and built the optical system in a compact size and presented some preliminary results here.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jiyoung Chu, Minhwan Seo, Hyungjin Kim, Wondon Joo, Sungmin Ahn, and Sangwoo Bae "Machine vision system for alignment in die-to-wafer bonder", Proc. SPIE 12222, Optical System Alignment, Tolerancing, and Verification XIV, 122220L (3 October 2022); https://doi.org/10.1117/12.2633000
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KEYWORDS
Semiconducting wafers

Optical alignment

Beam splitters

Distortion

Prisms

Cameras

Machine vision

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