Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics

Jinming Chen; Zhaoxiang Liu; Lvbin Song; Chao Sun; Guanhua Wang; Ya Cheng

doi:10.1117/12.2657586

17 March 2023 Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics

Jinming Chen, Zhaoxiang Liu, Lvbin Song, Chao Sun, Guanhua Wang, Ya Cheng

Proceedings Volume 12411, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXIII; 1241109 (2023) https://doi.org/10.1117/12.2657586
Event: SPIE LASE, 2023, San Francisco, California, United States

Abstract

Photolithography assisted chemo-mechanical etching (PLACE), a technique specifically developed for fabricating high-quality large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled fabrication of a series of building blocks of PICs ranging from high-quality (high-Q) micro-resonators and low-loss waveguides to electrooptically (EO) tunable lasers and waveguide amplifiers. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high-repetition-rate femtosecond laser and a high-speed polygon laser scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale fabrication of TFLN-based photonic structures, optical phase masks as well as color printing.

Conference Presentation

Citation Download Citation

Jinming Chen, Zhaoxiang Liu, Lvbin Song, Chao Sun, Guanhua Wang, and Ya Cheng "Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics", Proc. SPIE 12411, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXIII, 1241109 (17 March 2023); https://doi.org/10.1117/12.2657586

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