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30 April 2023 High-fidelity actinic ptychographic imaging of EUV photomasks enabled by illumination engineering
Bin Wang, Nathan J. Brooks, Iona Binnie, Michael Tanksalvala, Yuka Esashi, Nicholas W. Jenkins, Margaret M. Murnane, Henry C. Kapteyn
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Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 124960A (2023) https://doi.org/10.1117/12.2670528
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
As EUV lithography transitions to high volume manufacturing, actinic photomask inspection tools at 13.5 nm wavelength are attractive for understanding the printability of EUV mask defects, as well as for in-fab monitoring for possible defects emerging from extended use. Ptychography is a lensless imaging technique that allows for phase-and-amplitude, aberration-free, high-resolution imaging in the EUV. Moreover, sources based on high harmonic generation (HHG) of ultrafast lasers are a proven viable coherent light source for CDI, with flux sufficient for rapid large-area inspection and small-area imaging. By combining CDI and HHG, we implemented actinic EUV photomask inspection on a low-cost tabletop-scale setup. Moreover, we propose and demonstrate a solution to the decade-long challenge of ptychographic imaging of periodic structures through careful illumination engineering.
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Bin Wang, Nathan J. Brooks, Iona Binnie, Michael Tanksalvala, Yuka Esashi, Nicholas W. Jenkins, Margaret M. Murnane, and Henry C. Kapteyn "High-fidelity actinic ptychographic imaging of EUV photomasks enabled by illumination engineering", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124960A (30 April 2023); https://doi.org/10.1117/12.2670528
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KEYWORDS
Extreme ultraviolet
Photomasks
Illumination engineering
Diffraction
Beam divergence
Light sources
Light sources and illumination
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