Poster + Paper
15 August 2023 Interferograms analysis for measuring the thickness of aluminum thin films
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Conference Poster
Abstract
In this work, a specific procedure to measure the thickness of aluminum thin films by interferogram analysis is described. Six interferograms correspond to the image of the aluminum thin film superimposed with interference fringes are obtained from a Michelson-type interferential microscope. A six-frame phase shift algorithm is used to demodulate the optical phase. The measured phase is proportional to the height variation between the thin film wafer and the substrate. Finally, the obtained 3D height map permits us measure the thickness of the sample over an area of 1024 μm × 1280 μm.
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Ivan Choque, Miguel Asmad, Josue Miranda, and Alberto Quispe "Interferograms analysis for measuring the thickness of aluminum thin films", Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, 1261823 (15 August 2023); https://doi.org/10.1117/12.2672620
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KEYWORDS
Thin films

Interferograms

Aluminum

Film thickness

Microscopes

Optical surfaces

Phase shifts

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