Advantages of in-situ LTP distortion profile test on high heat load mirrors and applications

Shinan Qian; Werner H. Jark; Giovanni Sostero; Alessandro Gambitta; Fabio Mazzolini; Adolfo Savoia

doi:10.1117/12.259870

22 November 1996 Advantages of in-situ LTP distortion profile test on high heat load mirrors and applications

Shinan Qian, Werner H. Jark, Giovanni Sostero, Alessandro Gambitta, Fabio Mazzolini, Adolfo Savoia

Proceedings Volume 2856, Optics for High-Brightness Synchrotron Radiation Beamlines II; (1996) https://doi.org/10.1117/12.259870
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

The first in-situ distortion profile measurement of a high heat load mirror by use of the penta-prism LTP is presented. A maximum height distortion of 0.47 micron in tangential direction over a length of 180 mm was measured for an internally water-cooled mirror of a undulator beam line at ELETTRA while exposed to a total emitted power of 600 W (undulator gap 30 mm and current 180 mA). The experiment has an accuracy and repeatability of 0.04 micron. The test schematic and the test equipment are presented. Two measuring methods to scan a penta-prism being installed either outside or inside the vacuum chamber are introduced. Advantages and some possible applications of adopting the penta-prism LTP to make the in-situ profile test are explained.

Citation Download Citation

Shinan Qian, Werner H. Jark, Giovanni Sostero, Alessandro Gambitta, Fabio Mazzolini, and Adolfo Savoia "Advantages of in-situ LTP distortion profile test on high heat load mirrors and applications", Proc. SPIE 2856, Optics for High-Brightness Synchrotron Radiation Beamlines II, (22 November 1996); https://doi.org/10.1117/12.259870

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