Detection capability for chrome defect of tri-tone PSM

Jung-Kwan Lee; Dae-Woo Kim; Kyong-Mun Shin; Dong-Heok Lee; Jin-Min Kim; Sang-Soo Choi

doi:10.1117/12.504205

28 August 2003 Detection capability for chrome defect of tri-tone PSM

Jung-Kwan Lee, Dae-Woo Kim, Kyong-Mun Shin, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504205
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

The semiconductor industry continuously shrink the linewidths and the smaller linewidths are easily affected by the defects. The defects have to be detected to prevent printed images on wafers. This paper will present the detection capability of current inspection machines for chrome defects on attenuated MoSiN layer and simulation results for the effect of chrome defect on attenuated layer. Two inspection machines based on i-line light source were used for comparison of detection capability for chrome defect on attenuated layer. The effect of chrome defect on attenuated MoSiN layer was evaluated with MSM 100 at 248 nm wavelength.

Citation Download Citation

Jung-Kwan Lee, Dae-Woo Kim, Kyong-Mun Shin, Dong-Heok Lee, Jin-Min Kim, and Sang-Soo Choi "Detection capability for chrome defect of tri-tone PSM", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504205

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