Mr. Dae-Woo Kim Profile

Dae-Woo Kim

at Photronics Inc

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Author

Publications (6)

Proceedings Article | 20 August 2004 Paper

The judgment criteria of halftone pinhole defects

Kyong Mun Shin, Dae-Woo Kim, Jung-Kwan Lee, Dong-Hyuk Lee, Jin-Min Kim, Sang-Soo Choi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557728

KEYWORDS: Halftones, Transmittance, Inspection, Photomasks, Semiconducting wafers, Ion beams, Defect inspection, Inspection equipment, Image transmission, Defect detection

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Proceedings Article | 20 August 2004 Paper

Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing

Yong-Dae Kim, Dae-Woo Kim, Dong-Seuk Lee, Pil-Jin Jang, Hyuk-Joo Kwon, Hyun-Jun Cho, Jin-Min Kim, Sang-Soo Choi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557721

KEYWORDS: Etching, Carbon, Photomasks, Scanning probe microscopy, Plasma, Chromium, Lithography, Polymers, Critical dimension metrology, Fluorine

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Proceedings Article | 28 August 2003 Paper

Detection capability for chrome defect of tri-tone PSM

Jung-Kwan Lee, Dae-Woo Kim, Kyong-Mun Shin, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504205

KEYWORDS: Inspection, Photomasks, Chromium, Semiconducting wafers, Phase shifts, Transmittance, Light sources, Quartz, Defect inspection, Semiconductors

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Proceedings Article | 28 August 2003 Paper

Evaluation of EA-PSM opaque repair on 90-nm lithography

Dae-Woo Kim, Jung-Kwan Lee, Sang-Hoi Koo, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504210

KEYWORDS: Ion beams, Opacity, Critical dimension metrology, Lithography, Bridges, Photomasks, Image quality, Inspection, Visibility, Phase shifts

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Proceedings Article | 1 August 2002 Paper

Characteristics of residues and optical change of HT PSM during stepwise wet cleaning and optimization of HT PSM cleaning process

Woo-Gun Jeong, Dae-Woo Kim, Chang-Min Park, Ki-Won An, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi, Soo Hong Jeong

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476970

KEYWORDS: Etching, Inspection, Particles, Transmittance, Dry etching, Quartz, Neodymium, Scanning electron microscopy, Industrial chemicals, Defect inspection

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Proceedings Article | 11 March 2002 Paper

Defects analysis of mask blanks

Dong-Heok Lee, Dae-Woo Kim, Jung-Kwan Lee, Woo-Gun Jeong, Sang-Soo Choi, Sung-Mo Jung, Soo-Hong Jeong

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458336

KEYWORDS: Photomasks, Inspection, Quartz, Semiconducting wafers, Scanning electron microscopy, Defect detection, Image transmission, Printing, Photography, Image processing

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Showing 5 of 6 publications

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