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29 April 2004 Intel nanotechnology integrated process control systems: an overview
Kumud Srinivasan, Youssry Botros
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Proceedings Volume 5378, Data Analysis and Modeling for Process Control; (2004) https://doi.org/10.1117/12.543298
Event: Microlithography 2004, 2004, Santa Clara, California, United States
Abstract
As patterning dimensions decrease, die yield and performance become increasingly sensitive to smaller amounts of process variations. To minimize variability, Process Control is applied to prevent excursions, improve yield, decrease non-product runs, reduce cycle time due to rework, and reduce equipment calibration and maintenance. Intel inline Process Control aims at rapid detection, classification, prediction, and correction of problems and/or non-optimal performance during wafer processing. For efficient process control, robust analysis is needed in order to monitor the process, detect, and predict the process behavior. The paper will address Intel model based control and will focus on the various model based analysis and control modules that Intel has developed, and deployed for different technology generations. With the rapid increases in the number of analysis and control modules and the emerging need for integrating such modules to allow sharing of data, applications and methods, there is a need to define standard interfaces for such modules. This need motivated Intel to lead the development of SEMI E133; the Process Control Systems (PCS) Standard that was approved on October 2003.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Kumud Srinivasan and Youssry Botros "Intel nanotechnology integrated process control systems: an overview", Proc. SPIE 5378, Data Analysis and Modeling for Process Control, (29 April 2004); https://doi.org/10.1117/12.543298
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KEYWORDS
Process control
Data modeling
Standards development
Semiconducting wafers
Error analysis
Statistical analysis
Control systems
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