Modeling of dielectric polarization during an electron beam exposure

S. S. Borisov; Eugene A. Grachev; S. I. Zaitsev; N. N. Negulyaev; E. A. Cheremukhin

doi:10.1117/12.552222

1 March 2004 Modeling of dielectric polarization during an electron beam exposure

S. S. Borisov, Eugene A. Grachev, S. I. Zaitsev, N. N. Negulyaev, E. A. Cheremukhin

Proceedings Volume 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics; (2004) https://doi.org/10.1117/12.552222
Event: Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, 2003, Moscow, Russian Federation

Abstract

On the basis of Monte-Carlo method a new approach to modeling of an electron interaction with a substance is offered. Some phenomena concerned with spatial energy distribution and accumulation of a charge in an irradiated sample are considered. Calculations of distributions of electric potential and resists polarization induced by an injected charge are presented. It is shown that charging is still the essential circumstance, capable to cause significant loss of accuracy in electron-beam lithography.

Citation Download Citation

S. S. Borisov, Eugene A. Grachev, S. I. Zaitsev, N. N. Negulyaev, and E. A. Cheremukhin "Modeling of dielectric polarization during an electron beam exposure", Proc. SPIE 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, (1 March 2004); https://doi.org/10.1117/12.552222

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