Gabor filters and SVM classifier for pattern wafer segmentation

Pierrick T. Bourgeat; Fabrice Meriaudeau; Patrick Gorria; Kenneth W. Tobin

doi:10.1117/12.581242

1 November 2004 Gabor filters and SVM classifier for pattern wafer segmentation

Pierrick T. Bourgeat, Fabrice Meriaudeau, Patrick Gorria, Kenneth W. Tobin

Proceedings Volume 5607, Wavelet Applications in Industrial Processing II; (2004) https://doi.org/10.1117/12.581242
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States

Abstract

In the last decade, the accessibility of inexpensive and powerful computers has allowed true digital holography to be used for industrial inspection using microscopy. This technique allows capturing a complex image of a scene (i.e. containing magnitude and phase), and reconstructing the phase and magnitude information. Digital holograms give a new dimension to texture analysis since the topology information can be used as an additional way to extract features. This new technique can be used to extend previous work on image segmentation of patterned wafers for defect detection. This paper presents a comparison between the features obtained using Gabor filtering on complex images under illumination and focus variations.

Citation Download Citation

Pierrick T. Bourgeat, Fabrice Meriaudeau, Patrick Gorria, and Kenneth W. Tobin "Gabor filters and SVM classifier for pattern wafer segmentation", Proc. SPIE 5607, Wavelet Applications in Industrial Processing II, (1 November 2004); https://doi.org/10.1117/12.581242

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