Integrating Philips’ extreme UV source in the alpha-tools

Joseph Pankert; Rolf Apetz; Klaus Bergmann; Guenther Derra; Maurice Janssen; Jeroen Jonkers; Jurgen Klein; Thomas Kruecken; Andreas List; Michael Loeken; Christof Metzmacher; Willi Neff; Sven Probst; Ralph Prummer; Oliver Rosier; Stefan Seiwert; Guido Siemons; Dominik Vaudrevange; Dirk Wagemann; Achim Weber; Peter Zink; Oliver Zitzen

doi:10.1117/12.598650

6 May 2005 Integrating Philips' extreme UV source in the alpha-tools

Joseph Pankert, Rolf Apetz, Klaus Bergmann, Guenther Derra, Maurice Janssen, Jeroen Jonkers, Jurgen Klein, Thomas Kruecken, Andreas List, Michael Loeken, Christof Metzmacher, Willi Neff, Sven Probst, Ralph Prummer, Oliver Rosier, Stefan Seiwert, Guido Siemons, Dominik Vaudrevange, Dirk Wagemann, Achim Weber, Peter Zink, Oliver Zitzen

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.598650
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The paper describes recent progress in the development of the Philips's EUV source. Progress has been realized at many frontiers: Integration studies of the source into a scanner have primarily been studied on the Xe source because it has a high degree of maturity. We report on integration with a collector, associated collector lifetime and optical characteristics. Collector lifetime in excess of 1 bln shots could be demonstrated. Next, an active dose control system was developed and tested on the Xe lamp. Resulting dose stability data are less than 0.2% for an exposure window of 100 pulses. The second part of the paper reports on progress in the development of the Philips' Sn source. First, the details of the concept are described. It is based on a Laser triggered vacuum arc, which is an extension with respect to previous designs. The source is furbished with rotating electrodes that are covered with a Sn film that is constantly regenerated. Hence by the very design of the source, it is scalable to very high power levels, and moreover has fundamentally solved the notorious problem of electrode erosion. Power values of 260 W in 2p sr are reported, along with a stable, long life operation of the lamp. The paper also addresses the problem of debris generation and mitigation of the Sn-source. The problem is attacked by a combined strategy of protection of the collector by traditional means (e.g. fields, foiltraps... ), and by designing the gas atmosphere according to the principles of the well known halogen cycles in incandescent lamps. These principles have been studied in the Lighting industry for decades and rely on the excessively high vapor pressures of metal halides. Transferred to the Sn source, it allows pumping away tin residues that would otherwise irreversibly deposit on the collector.

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Joseph Pankert, Rolf Apetz, Klaus Bergmann, Guenther Derra, Maurice Janssen, Jeroen Jonkers, Jurgen Klein, Thomas Kruecken, Andreas List, Michael Loeken, Christof Metzmacher, Willi Neff, Sven Probst, Ralph Prummer, Oliver Rosier, Stefan Seiwert, Guido Siemons, Dominik Vaudrevange, Dirk Wagemann, Achim Weber, Peter Zink, and Oliver Zitzen "Integrating Philips' extreme UV source in the alpha-tools", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.598650

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