Dr. Günther H. Derra Profile

Dr. Günther H. Derra

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Publications (10)

Proceedings Article | 7 August 2023 Poster + Paper

Design of multi-aperture beam integrators for homogenization and local controllability of irradiance distributions from high power VCSEL systems

Jacqueline Dahlmanns, Thomas Bussek, Annika Völl, Jochen Stollenwerk, Carlo Holly, Günther Derra, Markus Herper, Ralf Conrads, Holger Mönch, Felix Ogiewa

Proceedings Volume 12624, 126240S (2023) https://doi.org/10.1117/12.2680279

KEYWORDS: Vertical cavity surface emitting lasers, Design and modelling, Aspheric lenses, Light sources and illumination, Lens arrays, Homogenization, Switching, Beam divergence, Optical design

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Proceedings Article | 13 March 2015 Paper

High-power VCSEL systems and applications

Holger Moench, Ralf Conrads, Carsten Deppe, Guenther Derra, Stephan Gronenborn, Xi Gu, Gero Heusler, Johanna Kolb, Michael Miller, Pavel Pekarski, Jens Pollmann-Retsch, Armand Pruijmboom, Ulrich Weichmann

Proceedings Volume 9348, 93480W (2015) https://doi.org/10.1117/12.2076267

KEYWORDS: Vertical cavity surface emitting lasers, Manufacturing, High power lasers, Laser systems engineering, Light emitting diodes, Reliability, Semiconducting wafers, Lamps, Photography, Heat treatments

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Proceedings Article | 18 March 2009 Paper

Xenon DPP source technologies for EUVL exposure tools

Masaki Yoshioka, Denis Bolshukhin, Marc Corthout, Günther Derra, Sven Götze, Jeroen Jonkers, Jürgen Kleinschmidt, Rainer Müller, Max Schürmann, Guido Schriever, Rob Snijkers, Peter Zink

Proceedings Volume 7271, 727109 (2009) https://doi.org/10.1117/12.814100

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Xenon, Plasma, Tin, Integrated optics, Scanners, Curtains, Electrodes, Reliability

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Proceedings Article | 27 March 2008 Paper

Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM

Marc Corthout, Rolf Apetz, Jesko Brudermann, Marcel Damen, Günther Derra, Oliver Franken, Jeroen Jonkers, Jürgen Klein, Felix Küpper, Arnaud Mader, Willi Neff, Hans Scheuermann, Guido Schriever, Max Schürmann, Guido Seimons, Rob Snijkers, Dominik Vaudrevange, Erik Wagenaars, Peiter van de Wel, Masaki Yoshioka, Peter Zink, Oliver Zitzen

Proceedings Volume 6921, 69210V (2008) https://doi.org/10.1117/12.772633

KEYWORDS: Extreme ultraviolet, Tin, Plasma, Pulsed laser operation, Extreme ultraviolet lithography, Astatine, Ultraviolet radiation, Electrodes, Capacitors, Lithography

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Proceedings Article | 23 March 2006 Paper

EUV sources for the alpha-tools

Joseph Pankert, Rolf Apetz, Klaus Bergmann, Marcel Damen, Günther Derra, Oliver Franken, Maurice Janssen, Jeroen Jonkers, Jürgen Klein, Helmar Kraus, Thomas Krücken, Andreas List, Micheal Loeken, Arnaud Mader, Christof Metzmacher, Willi Neff, Sven Probst, Ralph Prümmer, Oliver Rosier, Stefan Schwabe, Stefan Seiwert, Guido Siemons, Dominik Vaudrevange, Dirk Wagemann, Achim Weber, Oliver Zitzen

Proceedings Volume 6151, 61510Q (2006) https://doi.org/10.1117/12.657066

KEYWORDS: Tin, Extreme ultraviolet, Scanners, Lamps, Electrodes, Reflectivity, Control systems, Extreme ultraviolet lithography, Interfaces, Control systems design

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Proceedings Article | 6 May 2005 Paper

Integrating Philips’ extreme UV source in the alpha-tools

Joseph Pankert, Rolf Apetz, Klaus Bergmann, Guenther Derra, Maurice Janssen, Jeroen Jonkers, Jurgen Klein, Thomas Kruecken, Andreas List, Michael Loeken, Christof Metzmacher, Willi Neff, Sven Probst, Ralph Prummer, Oliver Rosier, Stefan Seiwert, Guido Siemons, Dominik Vaudrevange, Dirk Wagemann, Achim Weber, Peter Zink, Oliver Zitzen

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598650

KEYWORDS: Tin, Lamps, Extreme ultraviolet, Reflectivity, Xenon, Ruthenium, Control systems, Electrodes, Extreme ultraviolet lithography, Chemical species

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Proceedings Article | 20 May 2004 Paper

Status of Philips' extreme UV source

Joseph Pankert, Klaus Bergmann, Juergen Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Sven Probst, Dominik Vaudrevange, Guido Siemons, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Guenther Derra, Thomas Kruecken, Peter Zink

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538041

KEYWORDS: Tin, Xenon, Extreme ultraviolet, Plasma, Lamps, Ions, Electrodes, Diffusion, Physics, Chemical species

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Proceedings Article | 16 June 2003 Paper

Physical properties of the HCT EUV source

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483611

KEYWORDS: Extreme ultraviolet, Xenon, Plasma, Tin, Ions, Electrodes, Ionization, Extreme ultraviolet lithography, Magnetism, Scanners

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Proceedings Article | 16 June 2003 Paper

Collection efficiency of EUV sources

Guenther Derra, Wolfgang Singer

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482641

KEYWORDS: Extreme ultraviolet, Lithium, Lithography, Personal protective equipment, Coded apertures, Stereolithography, Wafer-level optics, Projection systems, Plasma, Ray tracing

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Proceedings Article | 1 July 2002 Paper

Physical properties of the HCT EUV source

Joseph Pankert, Klaus Bergmann, J. Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Guenther Derra

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472271

KEYWORDS: Extreme ultraviolet, Optical filters, Electrodes, Deep ultraviolet, Image filtering, Xenon, Extreme ultraviolet lithography, Lamps, Switching, Mirrors

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Showing 5 of 10 publications

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