Optical module fabrication using nanoimprint technology

Markus Rossi; Hartmut Rudmann; Susanne Westenhöfer; Martin Salt; Rainer Pelzer

doi:10.1117/12.646520

23 January 2006 Optical module fabrication using nanoimprint technology

Markus Rossi, Hartmut Rudmann, Susanne Westenhöfer, Martin Salt, Rainer Pelzer

Proceedings Volume 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV; 61100L (2006) https://doi.org/10.1117/12.646520
Event: MOEMS-MEMS 2006 Micro and Nanofabrication, 2006, San Jose, California, United States

Abstract

UV-NanoImprint Lithography (NIL) is a fast and low cost method, which becomes an increasingly important instrument for fabrication of μ-TAS and telecommunication devices. The key elements of UV-NIL are transparent molds and low viscosity resists. Two different transparent mold materials, allowing UV curing through the stamp, were developed: rigid quartz or flexible PDMS. Typical resist viscosities are in a range of <100mPas, ensuring fast and successful filling of the stamp cavities. UV-curing is carried out at a wavelength of 350-450 nm.

Citation Download Citation

Markus Rossi, Hartmut Rudmann, Susanne Westenhöfer, Martin Salt, and Rainer Pelzer "Optical module fabrication using nanoimprint technology", Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 61100L (23 January 2006); https://doi.org/10.1117/12.646520

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available