XR Image Quality test systems converge to do it all

Daniel Winters; Jan-Hinrich Eggers

doi:10.1117/12.3004824

13 March 2024 XR Image Quality test systems converge to do it all

Daniel Winters, Jan-Hinrich Eggers

Proceedings Volume PC12913, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) V; PC129130F (2024) https://doi.org/10.1117/12.3004824
Event: SPIE AR | VR | MR, 2024, San Francisco, California, United States

Abstract

Optical system metrology is important for best product quality of XR headsets and their components. The test technology used to qualify these components and sub-modules originates from two different fields: display metrology and optical system test: Display-test-derived systems use widefield optics and test low-frequency "macro"-scale parameters like ISO contrast and color and brightness homogeneity. Because of design choices, these systems cannot test "micro"-scale higher-frequency features like contrast of projected text or chromatic aberrations. The typically non-diffraction limited optical designs do not allow reporting correct values for e.g. MTF because of physics limitations. Higher spatial frequencies corresponding to finer details ("micro"-scale) are the domain of optics testing-derived technology, however the design choices typically used here make testing at the "macro"-level difficult.

In this paper, we demonstrate that neither one of the two technologies is sufficient to support the requirements of upcoming headset generations. Instead, we describe a new generation of test equipment that integrates both "micro"- and "macro"-scale test capabilities in one instrument.

Conference Presentation

Citation Download Citation

Daniel Winters and Jan-Hinrich Eggers "XR Image Quality test systems converge to do it all", Proc. SPIE PC12913, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) V, PC129130F (13 March 2024); https://doi.org/10.1117/12.3004824

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