CONFERENCE PROCEEDINGS
Advanced Search
Home > Journals > J. Micro/Nanolith. MEMS MOEMS > Volume 17 > Issue 2 > Article
Open Access
27 April 2018 Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes
Gavin C. Rider
Author Affiliations +
Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 17, Issue 2, 020901 (April 2018). https://doi.org/10.1117/1.JMM.17.2.020901
Abstract
This paper explains how an electric field and a reticle interact and describes the different kinds of damage that can be caused to a reticle through its exposure to electric field. It is shown why electrostatic reticle damage has changed from ESD damage (which causes yield to suddenly drop precipitously) into a gradual and cumulative form of degradation that is very difficult to diagnose. It is explained why some of the approaches that have been taken to reduce ESD damage in the semiconductor factory, such as equipotential bonding and the use of static dissipative plastics for making reticle pods, actually increase the risk of this cumulative type of electrostatic degradation in reticles. When assessing the risk to reticles and designing an effective protective strategy for reticle handling, it is shown why one must take into account the temporal characteristics of a reticle’s interaction with electric field—including the effect that the reticle’s immediate surroundings will have on that interaction—as well as considering the strength of any electric field in the reticle handling environment. Solutions are presented that would allow the electrostatic risk to reticles to be reduced significantly, without requiring major changes to operating procedures in semiconductor manufacturing facilities.
© 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)
Citation Download Citation
Gavin C. Rider "Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes," Journal of Micro/Nanolithography, MEMS, and MOEMS 17(2), 020901 (27 April 2018). https://doi.org/10.1117/1.JMM.17.2.020901
Received: 17 January 2018; Accepted: 27 March 2018; Published: 27 April 2018
JOURNAL ARTICLE
 16 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reticles
Semiconductors
Sensors
Microelectronics
Air contamination
Manufacturing
Semiconductor manufacturing
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top