Dr. Alastair A. MacDowell Profile

Dr. Alastair A. MacDowell

Staff Scientist at Lawrence Berkeley National Lab

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Publications (33)

Proceedings Article | 29 August 2022 Presentation + Paper

Presentation + Paper

Modeling effects of charge sharing on the response of the FOXSI sounding rockets

Jessie Duncan, P. Athiray, Sophie Musset, Juliana Vievering, Shunsaku Nagasawa, Juan Camilo Buitrago Casas, Lindsay Glesener, Tadayuki Takahashi, Shin Watanabe, Yixian Zhang, Steven Christe, Alastair MacDowell, Sӓm Krucker

Proceedings Volume 12191, 121911E (2022) https://doi.org/10.1117/12.2629443

KEYWORDS: Sensors, Spatial resolution, Rockets, Point spread functions, Deconvolution, Data modeling, Imaging systems, Process modeling, Instrument modeling, Hard x-rays, Solar radiation, Sun, X-ray astronomy, X-ray detectors

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The Focusing Optics X-ray Solar Imager (FOXSI ) sounding rockets are the first solar-dedicated direct-focusing hard X-ray (HXR) instruments. FOXSI rockets use Wolter-1 style HXR optics and solid state double-sided strip detectors. FOXSI images of solar HXR sources are influenced by the point spread function of the optics, the 2D segmentation of the detector into strip intersections, and noise in the detector readout. For FOXSI-4, new high-resolution optics will cause the instrument angular resolution to be limited by the minimum strip pitch of its CdTe detectors (60 μm).

FOXSI images are also affected by charge sharing in the detector, when one incident photon causes signals in multiple adjacent strips. Charge sharing is more likely the closer a photon is incident to a strip boundary, making it a sub-strip-position-dependent effect. Tests of a FOXSI-3 CdTe detector (with 60 μm strip pitch) at a synchrotron beamline (the Advanced Light Source) have allowed for characterization of charge shared events. This knowledge is used to develop new methods for achieving sub-strip resolution in FOXSI detectors (0.6-3", depending on incident photon position), applicable in the future to the FOXSI-4 detectors (or other similar systems).

To evaluate the performance of these methods, a model has been developed combining the FOXSI-3 optical and detector response, the latter incorporating lab-measured properties of charge sharing in the system. Using this model, generated sources are convolved with the FOXSI-3 system to simulate FOXSI data. A corresponding deconvolution process then extracts a reconstructed source from the simulated data using the new imaging methods, and the original and reconstructed sources can be compared. We show that the reconstructed source approximates the original with higher spatial resolution than that which results from using strip-based position knowledge only. Notably, we demonstrate a new ability to resolve independent sources located only one strip pitch apart.

Proceedings Article | 25 August 2020 Presentation

Presentation

Preliminary design of a set of four beamlines for the DLSR upgrade of the advanced light source

Antoine Wojdyla, Henry Alvarez, Maxime Bergeret, Albert Sheng, Diane Bryant, Arnaud Allezy, Grand Cutler, Valeriy Yashchuk, Alastair MacDowell, Kenneth Goldberg, Manuel Sanchez del Rio, Simon Morton, Elaine DiMasi, Howard Padmore

Proceedings Volume 11493, 1149304 (2020) https://doi.org/10.1117/12.2569298

KEYWORDS: Light sources, Tolerancing, X-ray diffraction, X-rays, Photon transport, Monochromators, Optical simulations, Ray tracing, Wavefronts, Wave propagation

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Proceedings Article | 8 June 2018 Presentation + Paper

Presentation + Paper

Achieving fast high-resolution 3D imaging by combining synchrotron x-ray microCT, advanced algorithms, and high performance data management

Dilworth Parkinson, Joseph Pacold, Miela Gross, Tristan McDougall, Chandler Jones, John Bows, Ian Hamilton, Danil Smiles, Stefano De Santis, Alessandro Ratti, Daniël Pelt, James Sethian, Harold Barnard, Joshua Peterson, Alvaro Ramirez-Hong, Alastair MacDowell, David Shuh

Proceedings Volume 10656, 106560S (2018) https://doi.org/10.1117/12.2307272

KEYWORDS: Image quality, Tomography, Cameras, X-rays, Image segmentation, Neural networks, Stereoscopy, Synchrotrons, Synchrotron x-ray imaging, X-ray imaging

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Proceedings Article | 26 September 2017 Presentation + Paper

Presentation + Paper

Machine learning for micro-tomography

Dilworth Parkinson, Daniël Pelt, Talita Perciano, Daniela Ushizima, Harinarayan Krishnan, Harold Barnard, Alastair MacDowell, James Sethian

Proceedings Volume 10391, 103910J (2017) https://doi.org/10.1117/12.2274731

KEYWORDS: Machine learning, Image segmentation, Neural networks, Image retrieval, Nonlinear filtering, Cameras, Tomography, Data modeling, Image quality, Image visualization

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Proceedings Article | 3 October 2016 Paper

Paper

Developments in synchrotron x-ray micro-tomography for in-situ materials analysis at the Advanced Light Source

Harold Barnard, A. MacDowell, D. Parkinson, S. Venkatakrishnan, F. Panerai, N. Mansour

Proceedings Volume 9967, 99671H (2016) https://doi.org/10.1117/12.2238305

KEYWORDS: Tomography, Synchrotrons, X-rays, Light sources, Imaging systems, Cameras, Reconstruction algorithms, Microscopes, Scintillators, Carbon

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Proceedings Article | 17 September 2014 Paper

Paper

Reflection on multilayer mirrors: beam profile and coherence properties

A. Rack, C. Morawe, L. Mancini, D. Dreossi, D. Parkinson, A. MacDowell, F. Siewert, T. Rack, T. Holz, M. Krämer, R. Dietsch

Proceedings Volume 9207, 92070V (2014) https://doi.org/10.1117/12.2060801

KEYWORDS: Multilayers, Mirrors, Wavefronts, Reflection, X-rays, Light sources, Monochromators, Silicon, Reflectivity, Crystals

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Proceedings Article | 12 September 2014 Paper

Paper

High performance data management and analysis for tomography

Justin Blair, Richard Canon, Jack Deslippe, Abdelilah Essiari, Alexander Hexemer, Alastair MacDowell, Dilworth Parkinson, Simon Patton, Lavanya Ramakrishnan, Nobumichi Tamura, Brian Tierney, Craig Tull

Proceedings Volume 9212, 92121G (2014) https://doi.org/10.1117/12.2069862

KEYWORDS: Databases, Tomography, Data archive systems, Visualization, Data storage, Computing systems, Reconstruction algorithms, Light sources, Hard x-rays, Data processing

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Proceedings Article | 17 October 2012 Paper

Paper

X-ray micro-tomography at the Advanced Light Source

A. MacDowell, D. Parkinson, A. Haboub, E. Schaible, J. Nasiatka, C. Yee, J. Jameson, J. Ajo-Franklin, C. Brodersen, A. McElrone

Proceedings Volume 8506, 850618 (2012) https://doi.org/10.1117/12.930243

KEYWORDS: Cameras, X-rays, Monochromators, Scintillators, Image resolution, Tomography, Spatial resolution, Light sources, Carbon dioxide, Crystals

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Proceedings Article | 15 October 2012 Paper

Paper

Coded aperture imaging for fluorescent x-rays

A. Haboub, A. MacDowell, S. Marchesini, D. Parkinson

Proceedings Volume 8502, 850209 (2012) https://doi.org/10.1117/12.981244

KEYWORDS: Coded apertures, Coded aperture imaging, X-rays, Sensors, Algorithm development, X-ray imaging, Modulation transfer functions, Charge-coupled devices, Spatial resolution, X-ray detectors

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Proceedings Article | 13 September 2011 Paper

Paper

Statistical segmentation and porosity quantification of 3D x-ray microtomography

Daniela Ushizima, Dilworth Parkinson, Peter Nico, Jonathan Ajo-Franklin, Alastair MacDowell, Benjamin Kocar, Wes Bethel, James Sethian

Proceedings Volume 8135, 813502 (2011) https://doi.org/10.1117/12.892809

KEYWORDS: Image segmentation, Image filtering, Digital filtering, 3D image processing, Solids, X-rays, Image processing algorithms and systems, 3D modeling, Filtering (signal processing), Image processing

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Proceedings Article | 2 September 2010 Paper

Paper

Compressive phase contrast tomography

F. Maia, A. MacDowell, S. Marchesini, H. Padmore, D. Parkinson, J. Pien, A. Schirotzek, C. Yang

Proceedings Volume 7800, 78000F (2010) https://doi.org/10.1117/12.861946

KEYWORDS: Tomography, Phase contrast, Light sources, X-rays, Radon transform, Radon, Signal to noise ratio, Fourier transforms, Sensors, Hard x-rays

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SPIE Journal Paper | 1 August 2009

Optimal tuning and calibration of bendable mirrors with slope-measuring profilers

Wayne McKinney, Jonathan Kirschman, Alastair MacDowell, Anthony Warwick, Valeriy Yashchuk

OE, Vol. 48, Issue 08, 083601, (August 2009) https://doi.org/10.1117/12.10.1117/1.3204235

KEYWORDS: Mirrors, Calibration, Ray tracing, Optical engineering, Computer programming, Metrology, Error analysis, Geometrical optics, Synchrotrons, Light sources

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Proceedings Article | 20 September 2007 Paper

Paper

New procedures for the adjustment of elliptically bent mirrors with the long trace profiler

Wayne McKinney, Steven Irick, Jonathan Kirschman, Alastair MacDowell, Tony Warwick, Valeriy Yashchuk

Proceedings Volume 6704, 67040G (2007) https://doi.org/10.1117/12.736860

KEYWORDS: Mirrors, Ray tracing, Wavefronts, Geometrical optics, Computer programming, Metrology, Monochromatic aberrations, Error analysis, Synchrotron radiation, X-rays

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Proceedings Article | 20 September 2007 Paper

Paper

Flat-field calibration of CCD detector for long trace profiler

Jonathan Kirschman, Edward Domning, Keith Franck, Steven Irick, Alastair MacDowell, Wayne McKinney, Gregory Morrison, Brian Smith, Tony Warwick, Valeriy Yashchuk

Proceedings Volume 6704, 67040J (2007) https://doi.org/10.1117/12.732618

KEYWORDS: Sensors, Calibration, Cameras, CCD image sensors, CCD cameras, Charge-coupled devices, Photodiodes, X-ray optics, Personal digital assistants, Image resolution

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Proceedings Article | 29 August 2006 Paper

Paper

Thermal and mechanical joints to cryo-cooled silicon monochromator crystals

A. MacDowell, S. Fakra, G. Morrison

Proceedings Volume 6317, 63171F (2006) https://doi.org/10.1117/12.697083

KEYWORDS: Silicon, Crystals, Monochromators, Indium, Copper, Interfaces, Laser crystals, Resistance, X-rays, 3D modeling

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Proceedings Article | 29 August 2006 Paper

Paper

Air convection noise of pencil-beam interferometer for long trace profiler

Valeriy Yashchuk, Steve Irick, Alastair MacDowell, Wayne McKinney, Peter Takacs

Proceedings Volume 6317, 63170D (2006) https://doi.org/10.1117/12.681297

KEYWORDS: Convection, Fluctuations and noise, Mirrors, Laser stabilization, Information operations, Interferometers, Optical testing, Semiconductor lasers, Beam analyzers, X-ray optics

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Proceedings Article | 17 September 2005 Paper

Paper

Cross-check of different techniques for two-dimensional power spectral density measurements of x-ray optics

Valeriy Yashchuk, Steve Irick, Eric Gullikson, Malcolm Howells, Alastair MacDowell, Wayne McKinney, Farhad Salmassi, Tony Warwick

Proceedings Volume 5921, 59210G (2005) https://doi.org/10.1117/12.619892

KEYWORDS: Mirrors, Modulation transfer functions, Spatial frequencies, X-rays, Scattering, Atomic force microscopy, X-ray optics, Interferometry, Microscopes, Surface finishing

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Proceedings Article | 29 August 2005 Paper

Paper

Two-dimensional power spectral density measurements of x-ray optics with the Micromap interferometric microscope

Valeriy Yashchuk, Andrew Franck, Steve Irick, Malcolm Howells, Alastair MacDowell, Wayne McKinney

Proceedings Volume 5858, 58580A (2005) https://doi.org/10.1117/12.612383

KEYWORDS: Modulation transfer functions, Spatial frequencies, Mirrors, Microscopes, Sensors, X-ray optics, Objectives, Information operations, Interferometry, X-rays

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Proceedings Article | 27 August 2005 Paper

Paper

Elimination of ‘ghost’-effect-related systematic errors in metrology of x-ray optics with a long trace profiler

Valeriy Yashchuk, Steve Irick, Alastair MacDowell

Proceedings Volume 5858, 58580X (2005) https://doi.org/10.1117/12.612386

KEYWORDS: Mirrors, Beam splitters, Sensors, Metrology, Data acquisition, X-rays, X-ray optics, Software development, Fourier transforms, Reflection

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Proceedings Article | 24 December 2002 Paper

Paper

Nickel-plated invar mirrors for synchrotron radiation beam lines

Malcolm Howells, P. Burt, Daniela Cambie, Robert Duarte, A. Franck, Steven Irick, Alastair MacDowell, D. MacGill, R. Paquin, David Plate

Proceedings Volume 4782, (2002) https://doi.org/10.1117/12.453759

KEYWORDS: Mirrors, Plating, Nickel, Polishing, X-rays, Heat treatments, Surface finishing, Carbon, Manganese, Gemini Planet Imager

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SPIE Journal Paper | 1 October 2000

Theory and practice of elliptically bent x-ray mirrors

Malcolm Howells, Daniela Cambie, Steven Irick, Alastair MacDowell, Howard Padmore, Timothy Renner, Seung Rah, Reuben Sandler

OE, Vol. 39, Issue 10, (October 2000) https://doi.org/10.1117/12.10.1117/1.1289879

KEYWORDS: Mirrors, X-rays, Monochromatic aberrations, Error analysis, Metals, Optical engineering, Polishing, Distortion, Manufacturing, Ceramics

Proceedings Article | 13 November 1998 Paper

Paper

Design, analysis, and performance of an epoxy-bonded bendable mirror

Neal Hartman, Philip Heimann, Alastair MacDowell, Keith Franck, Andrew Grieshop, Steven Irick, Howard Padmore

Proceedings Volume 3447, (1998) https://doi.org/10.1117/12.331128

KEYWORDS: Mirrors, Adhesives, Silicon, Epoxies, Etching, Finite element methods, X-rays, Aerospace engineering, Thermal modeling, Light sources

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Proceedings Article | 6 November 1998 Paper

Paper

Progress toward submicron hard x-ray imaging using elliptically bent mirrors and its applications

Alastair MacDowell, Chang-Hasnain Chang, G. Lamble, Richard Celestre, J. Patel, Howard Padmore

Proceedings Volume 3449, (1998) https://doi.org/10.1117/12.330341

KEYWORDS: X-rays, Mirrors, Crystals, Monochromators, Zinc, Aluminum, X-ray diffraction, Silicon, X-ray optics, Chromium

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Proceedings Article | 1 November 1997 Paper

Paper

Interferometric testing of EUV lithography cameras

Alastair MacDowell, Obert Wood, John Bjorkholm

Proceedings Volume 3152, (1997) https://doi.org/10.1117/12.279372

KEYWORDS: Cameras, Wavefronts, Extreme ultraviolet, Interferometry, Interferometers, Mirrors, Extreme ultraviolet lithography, Phase interferometry, Multilayers, Charge-coupled devices

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Proceedings Article | 1 November 1997 Paper

Paper

Progress toward submicron hard x-ray imaging using elliptically bent mirrors

Alastair MacDowell, Richard Celestre, Chang-Hasnain Chang, Keith Franck, Malcolm Howells, Scott Locklin, Howard Padmore, J. Patel, Reuben Sandler

Proceedings Volume 3152, (1997) https://doi.org/10.1117/12.279374

KEYWORDS: Mirrors, X-rays, Crystals, X-ray diffraction, X-ray optics, X-ray imaging, Monochromators, Hard x-rays, Signal detection, Diffraction

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Proceedings Article | 19 May 1995 Paper

Paper

Extreme UV resist technology: the limits of silylated resist resolution

Gary Taylor, Richard Hutton, Susan Stein, Craig Boyce, Obert Wood, Bruno LaFontaine, Alastair MacDowell, David Wheeler, Glenn Kubiak, Avijit Ray-Chaudhuri, Kurt Berger, Daniel Tichenor

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209168

KEYWORDS: Etching, Plasma, Silicon, Extreme ultraviolet lithography, Deep ultraviolet, Extreme ultraviolet, Carbon dioxide, Semiconducting wafers, Oxygen, Gases

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Silylated, dry-developed resists have demonstrated superior resolution, beyond that of their solution-developed resist counterparts. However, the implementation of plasma-developed resists in the manufacture of integrated circuit devices has not reached volume fabrication despite the fact that silylated resists minimize various imaging pitfalls including thickness variations over topography, limited depth of focus, thickness or swing curve effects and reflection4nduced exposure variations. This is exemplified with deep-UV lithography at 248 nm in which silylated resists have printed 200 urn features with a 0.53 NA exposure tool. Plans for implementing silylation technology are not imminent because of the conviction that solution-developed resists will meet the specifications for 250 urn design rule devices. Yet, will actual yields using solution-developed resists be adequate, will the processing and materials costs be acceptible and will the processes be extendable to much smaller features (0.2 pm) with or without optical tricks? For silylated resists, on the other hand, the issues are the availability of production worthy equipment, the complex nature of the processing, yields which may be adversely affected by particles produced during the plasma development process, process latitude, sensitivity and cost. For extreme UV lithography (EUVL) the silylated resist issues are somewhat different. This paper examines various aspects of silylated, plasma-developed resists to determine if they have the potential of resolving 100 nm features in thick (700 nm) resist films needed for device fabrication. The starting point is DUV performance. We have used a bi!ayer resist comprised of Shipley XP-8844 n hard-baked Shipley MP-1807 to resolve 200 nm lines and spaces (l/s) in 800 nm thickness films using 72 mJ/cm doses of 248 nm light, imaging at a Rayleigh k1 value of 0.43. It has been achieved because of advanced, Si-rich silylating reagents, control of plasma development conditions in a helicon-source etcher, control of thermal processing to minimize acid catalyst migration in the chemically amplified resist and control of flow during silylation. Applying the above k1 value to imaging at 13.5 nm with (NA) 0.08 predicts a 1/s resolution of 73 nm for EUVL. In practice this can't be achieved yet, but we report here on new developments in plasma etching and silylated resist flow control that are helping to reach this goal. Certain processing phenomena may limit resolution. In the imaging layer, migration of acid catalyst during and after exposure may blur the image. During and after silylation, swelling and flow may enlarge certain regions nonspecifically. Another factor is anisotropic etching of the planarizing layer such that no undercut of the masking layer occurs even upon * Present address: Dept. of Chemical Engineering, Mass. Inst. of Technology, Cambridge, MA 02139 ** Present address: Lawrence Livermore National Laboratory, P0 Box 808, Livermore, CA 94550 overetching. A final factor is absorption, which for EUVL, is almost independent of the resist, but is sensitive to wavelength. At 13 .5 nm the absorbance is so high that only surface imaging resist schemes are likely to give high resolution imaging in thick (0.70 pm) features. This paper provides an overview of developments in each of these areas that may limit silylated resist technology. Methods are described that minimize silylated resist flow, uniformly and reproducibly remove Si surface residue from exposed areas and reduce undercut during plasma developmentand overetch. Usin these methods we were able to obtain the first thick film images of sub 200 nm 1/s at reasonable EUV doses of 24 mJ/cm . The incremental understanding that has contributed to these results is discussed. Keywords: lithography, EUV, resists, silylated, plasma develop

Proceedings Article | 13 May 1994 Paper

Paper

Development of a laboratory extreme-ultraviolet lithography tool

Daniel Tichenor, Glenn Kubiak, Michael Malinowski, Richard Stulen, Steven Haney, Kurt Berger, Rodney Nissen, G. Wilkerson, Phillip Paul, S. Birtola, P. Jin, Richard Arling, Avijit Ray-Chaudhuri, William Sweatt, Weng Chow, John Bjorkholm, Richard Freeman, Marc Himel, Alastair MacDowell, Donald Tennant, Linus Fetter, Obert Wood, Warren Waskiewicz, Donald White, David Windt, Tanya Jewell

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175834

KEYWORDS: Cameras, Semiconducting wafers, Extreme ultraviolet, Photomasks, Mirrors, Extreme ultraviolet lithography, Imaging systems, Multilayers, Plasma, Optical alignment

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Proceedings Article | 1 February 1994 Paper

Paper

Application of laser plasma sources in soft x-ray projection lithography

Daniel Tichenor, Glenn Kubiak, Michael Malinowski, Richard Stulen, Steven Haney, Kurt Berger, Rodney Nissen, Randal Schmitt, G. Wilkerson, P. Jin, William Sweatt, Weng Chow, John Bjorkholm, Richard Freeman, Marc Himel, Alastair MacDowell, Donald Tennant, Obert Wood, Warren Waskiewicz, Donald White, David Windt, Tanya Jewell

Proceedings Volume 2015, (1994) https://doi.org/10.1117/12.167986

KEYWORDS: Plasma, Imaging systems, Xenon, X-rays, Solids, Objectives, Projection lithography, Mirrors, Photomasks, Multilayers

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Proceedings Article | 24 June 1993 Paper

Paper

Soft x-ray (14 nm) lithography with ultrathin imaging layers and selective electroless metallization

Jeffrey Calvert, Tim Koloski, Walter Dressick, Charles Dulcey, Martin Peckerar, Franco Cerrina, James Taylor, Doowon Suh, Obert Wood, Alastair MacDowell, Raissa D'Souza

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146514

KEYWORDS: X-rays, Metals, Electroluminescence, Silicon, Semiconducting wafers, X-ray lithography, Polymethylmethacrylate, Image processing, Halogens, Oxides

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Proceedings Article | 1 January 1992 Paper

Paper

Comparison of reflective mask technologies for soft x-ray projection lithography

Donald Tennant, John Bjorkholm, Ludwig Eichner, Richard Freeman, Tanya Jewell, Alastair MacDowell, J. Pastalan, L. Szeto, Warren Waskiewicz, Donald White, David Windt, Obert Wood

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56938

KEYWORDS: Reflectivity, Photomasks, Multilayers, Ions, Germanium, Etching, X-rays, Reactive ion etching, Gold, Polymethylmethacrylate

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Proceedings Article | 1 February 1991 Paper

Paper

Soft x-ray projection lithography: experiments and practical printers

Donald White, John Bjorkholm, Jeffrey Bokor, Ludwig Eichner, Richard Freeman, Jeffrey Gregus, Tanya Jewell, William Mansfield, Alastair MacDowell, Eric Raab, William Silfvast, L. Szeto, Donald Tennant, Warren Waskiewicz, David Windt, Obert Wood

Proceedings Volume 1343, (1991) https://doi.org/10.1117/12.23193

KEYWORDS: Cameras, Photomasks, X-rays, Mirrors, Reflectivity, Multilayers, Semiconducting wafers, X-ray lithography, Lithography, X-ray optics

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Proceedings Article | 1 February 1991 Paper

Paper

Performance of multilayer-coated figured optics for soft x-rays near the diffraction limit

Eric Raab, Donald Tennant, Warren Waskiewicz, Alastair MacDowell, Richard Freeman

Proceedings Volume 1343, (1991) https://doi.org/10.1117/12.23183

KEYWORDS: Mirrors, Multilayers, Coating, X-ray optics, Diffraction, X-rays, Imaging systems, X-ray imaging, X-ray diffraction, Reflection

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Proceedings Article | 1 May 1990 Paper

Paper

20:1 projection soft x-ray lithography using trilevel resist

Tanya Jewell, M. Becker, John Bjorkholm, Jeffrey Bokor, Ludwig Eichner, Richard Freeman, William Mansfield, Alastair MacDowell, M. O'Malley, Eric Raab, William Silfvast, L. Szeto, Donald Tennant, Warren Waskiewicz, Donald White, David Windt, Obert Wood, John Bruning

Proceedings Volume 1263, (1990) https://doi.org/10.1117/12.20173

KEYWORDS: Photomasks, Mirrors, Objectives, X-ray lithography, X-rays, Silicon, X-ray technology, Reflectivity, Imaging systems, Diffraction

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Showing 5 of 33 publications

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