Mr. Dongeun Cha Profile

Dongeun Cha

at SK Hynix Inc

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Publications (1)

Proceedings Article | 12 October 2021 Presentation + Paper

Sensitivity analysis based SEM measurement down-sampling approach for mask process modeling applications

Kushlendra Mishra, Rachit Sharma, Ingo Bork, Peter Buck, Dongeun Cha, Seungheon Na, Jaekwang Kim, Kiwook Park, Inpyo Kim

Proceedings Volume 11855, 118550Z (2021) https://doi.org/10.1117/12.2600926

KEYWORDS: Data modeling, Calibration, Photomasks, Process modeling, Statistical modeling, Scanning electron microscopy, Metrology, Critical dimension metrology, Error analysis

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