KEYWORDS: Plasmonics, Head, Nanolithography, Near field, Optical lithography, Near field optics, Data storage, Lithography, Metals, Optics manufacturing
Optical lithography has been the key for continuous size reduction of semiconductor devices and circuits manufacturing. Although the industry is continually improving the resolution, optical lithography becomes more
difficult and less cost effective in satisfying the ever increasing demands in nano-manufacturing. Besides manufacturing,
the dramatic advancements in nanoscale science and engineering also call an urgent need for high-throughput
nano-fabrication technologies that are versatile to frequent design changes. Here we experimentally demonstrated the
capability of patterning with 50 nm linewidth with a high flying speed at 10 meter/second. This low-cost nano-fabrication
scheme has the potential of a few orders of magnitude higher throughput than current maskless techniques, and promises a
new route towards the next generation nano-manufacturing. Besides its application in nanolithography, this technique can also be used for nanoscale metrology, imaging and data storage.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.