Dr. Eugene Barash Profile

Dr. Eugene Barash

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 14 August 1997 Paper

Broadband microlithography: process development using PROLITH simulator

Eugene Barash, Satwinder Randhawa

Proceedings Volume 3183, (1997) https://doi.org/10.1117/12.280554

KEYWORDS: Optical lithography, Optical simulations, Photoresist materials, Lithography, Ultraviolet radiation, Spectroscopes, Wafer testing, Semiconducting wafers, Cadmium sulfide

Read Abstract +

It was demonstrated that optical lithography simulations can be used very effectively for broadband application and they are not the forte of I-line lithography. PROLITH simulator was used to optimize the photo process on Ultratech 1500 broadband stepper. More than 40 process variables were required to customize the software for this process. To do a broadband simulation the optical parameters of photoresist should be measured accurately on multiple wavelengths. This information not always available from photoresist vendors and often tedious to obtain by means of UV spectroscopy. To do the final tune up the resist exposure rate C was scaled by the same factor N within the entire illumination range of 380-450 nm to match the experimental Dose-to-clear value E. Good agreement with experimental data was achieved on different device layers. Process window for the critical geometry was calculated based on the linewidth and sidewall angle specifications. Better understanding of the process allowed us to qualify new process into production in very short time frame and saved a lot of test wafers. Further process optimization is under way and efforts are being made to identify the optimum process for the future devices with smaller CDs.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years