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Eun-Ji Yang
at ASML Korea Co Ltd
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Publications (1)
Proceedings Article | 20 March 2020 Paper
Enabling accurate and robust optical metrology of in device overlay
Min-Seok Kang, Chan Hwang, Seungyoon Lee, Jeongjin Lee, Joon-Soo Park, Christian Leewis, Eun-Ji Yang, Do-Haeng Lee, James Lee, Sabil Huda, Noh-Kyoung Park, Anagnostis Tsiatmas, Giulio Bottegal, Amy Wang, Filippo Belletti, Jan Jitse Venselaar, Giacomo Miceli, Izabela Saj, Sam Chen
Proceedings Volume 11325, 1132529 (2020) https://doi.org/10.1117/12.2553446
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Measurement devices, Optical metrology, Etching, Scanners, Diffractive optical elements, Wafer testing, Optical testing
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