Dr. Guy Cohen Profile

Dr. Guy Cohen

at KLA Israel

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 18 April 2013 Paper

Quality metric for accurate overlay control in <20nm nodes

Dana Klein, Eran Amit, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Chin-Chou Kevin Huang, Ramkumar Karur-Shanmugam, Bill Pierson, Cindy Kato, Hiroyuki Kurita

Proceedings Volume 8681, 86811J (2013) https://doi.org/10.1117/12.2011454

KEYWORDS: Target detection, Semiconducting wafers, Overlay metrology, Yield improvement, Metrology, Calibration, Error analysis, Semiconductors, Manufacturing, Lithography

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Proceedings Article | 18 April 2013 Paper

Overlay accuracy calibration

Eran Amit, Dana Klein, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Cindy Kato, Hiroyuki Kurita

Proceedings Volume 8681, 86811G (2013) https://doi.org/10.1117/12.2011416

KEYWORDS: Calibration, Overlay metrology, Metrology, Semiconducting wafers, Optical filters, Neodymium, Time metrology, Process control, Ions, Data modeling

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Proceedings Article | 6 April 2012 Paper

Photoresist qualification using scatterometry CD

Roie Volkovich, Yosef Avrahamov, Guy Cohen, Patricia Fallon, Wenyan Yin

Proceedings Volume 8324, 832437 (2012) https://doi.org/10.1117/12.918392

KEYWORDS: Photoresist materials, Semiconducting wafers, Critical dimension metrology, Scatterometry, Semiconductors, Optical lithography, Photoresist processing, Reflectometry, Lithography, Chemistry

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Proceedings Article | 5 April 2012 Paper

Weighted least squares regression for advanced overlay control

Dana Klein, John Robinson, Guy Cohen, Chin-Chou Kevin Huang, Bill Pierson

Proceedings Volume 8324, 832425 (2012) https://doi.org/10.1117/12.916396

KEYWORDS: Overlay metrology, Data modeling, Metrology, Process control, Manufacturing, Semiconducting wafers, Optical filters, Control systems, Lithography, Integrated circuits

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Proceedings Article | 5 April 2012 Paper

Overlay quality metric

Guy Cohen, Eran Amit, Dana Klein, Daniel Kandel, Vladimir Levinski

Proceedings Volume 8324, 832424 (2012) https://doi.org/10.1117/12.916379

KEYWORDS: Process control, Error analysis, Metrology, Quality measurement, Overlay metrology, Precision measurement, Control systems, Scanners, Inspection, Optical lithography

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Proceedings Article | 5 April 2012 Paper

Overlay accuracy fundamentals

Daniel Kandel, Vladimir Levinski, Noam Sapiens, Guy Cohen, Eran Amit, Dana Klein, Irina Vakshtein

Proceedings Volume 8324, 832417 (2012) https://doi.org/10.1117/12.916369

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Optical filters, Quality measurement, Clouds, Wafer-level optics, Diffraction, Optical simulations, Computer simulations

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Showing 5 of 6 publications

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