Dr. Heath Pois Profile

Dr. Heath Pois

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Publications (8)

Proceedings Article | 13 June 2022 Presentation

In-line XPS metrology using unsupervised machine learning in high volume manufacturing

Paul Isbester, Ganesh Subramanian, Padraig Timoney, Taher Kagalwala, Dmitry Kislitsyn, Heath Pois, Mark Klare, Daniel Kandel, Michal Yachini, Wei Ti Lee, Vanessa Zhang, Mitch Shiver, Saurabh Singh, Parker Lund

Proceedings Volume PC12053, PC120530M (2022) https://doi.org/10.1117/12.2614116

KEYWORDS: Metrology, High volume manufacturing, Machine learning, Manufacturing, X-rays, X-ray characterization, Tolerancing, Semiconductors, Semiconductor manufacturing, Semiconducting wafers

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Proceedings Article | 24 March 2016 Paper

Hybrid enabled thin film metrology using XPS and optical

Alok Vaid, Givantha Iddawela, Sridhar Mahendrakar, Michael Lenahan, Mainul Hossain, Padraig Timoney, Abner Bello, Cornel Bozdog, Heath Pois, Wei Ti Lee, Mark Klare, Michael Kwan, Byung Cheol Kang, Paul Isbester, Matthew Sendelbach, Naren Yellai, Prasad Dasari, Tom Larson

Proceedings Volume 9778, 97780M (2016) https://doi.org/10.1117/12.2220299

KEYWORDS: Metrology, Thin films, X-rays, X-ray optics, Semiconducting wafers, Wafer-level optics, Process control, Ellipsometry, Diffractive optical elements, Deposition processes, Optical testing, Dielectrics, Optical properties

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Proceedings Article | 24 March 2016 Paper

XPS-XRF hybrid metrology enabling FDSOI process

Mainul Hossain, Ganesh Subramanian, Dina Triyoso, Jeremy Wahl, Timothy Mcardle, Alok Vaid, A. Bello, Wei Ti Lee, Mark Klare, Michael Kwan, Heath Pois, Ying Wang, Tom Larson

Proceedings Volume 9778, 97780N (2016) https://doi.org/10.1117/12.2219748

KEYWORDS: Metrology, Silicon, Optical metrology, Germanium, X-ray fluorescence spectroscopy, X-rays, Semiconducting wafers, Calibration, Sensors

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Proceedings Article | 5 April 2007 Paper

High-resolution in-die metrology using beam profile reflectometry and ellipsometry

Chungsam Jun, Jangik Park, Jon Opsal, Heath Pois, In-Kyo Kim, Jung-Wook Kim, Lena Nicolaides

Proceedings Volume 6518, 65183D (2007) https://doi.org/10.1117/12.712516

KEYWORDS: Metrology, Data modeling, Data acquisition, Reflectometry, Ellipsometry, Critical dimension metrology, Standards development, Spectroscopic ellipsometry, Process control, Artificial neural networks

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Proceedings Article | 10 May 2005 Paper

Strained-silicon metrology using a multi-technology optical system

Heath Pois, Stephen Morris, Jon Opsal, Ajit Paranjpe, Nyles Cody, Trevan Landin

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600035

KEYWORDS: Silicon, Data modeling, Semiconducting wafers, Germanium, Metrology, Optical metrology, Spectroscopy, Reflectometry, Spectrophotometry, Dispersion

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Proceedings Article | 10 May 2005 Paper

Optical characterization of 193nm amorphous carbon ARC films

Jingmin Leng, Jon Opsal, Heath Pois

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600138

KEYWORDS: Anisotropy, Semiconducting wafers, Etching, Carbon, Refractive index, Reflectance spectroscopy, Reflectometry, Ellipsometry, Optical properties, Data modeling

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Proceedings Article | 10 May 2005 Paper

Performance of measuring contact holes using the Opti-Probe 7341 3-D RT/CD technology

Osman Sorkhabi, Heath Pois, Hanyou Chu, Youxian Wen, Jon Opsal, Won Kim

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598955

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Process control, Metrology, Inspection, Data modeling, Reflectometry, Spectroscopy, Optical lithography, Lithography

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Proceedings Article | 27 January 2005 Paper

CD variation control based on accurate characterization of 193-nm material and CD metrology

Youxian Wen, Heath Pois, Jon Opsal

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577276

KEYWORDS: Critical dimension metrology, Dispersion, Process control, Optical properties, Standards development, Data modeling, Metrology, Very large scale integration, Lithography, Thin films

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Showing 5 of 8 publications

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